Cited 2 time in webofscience Cited 2 time in scopus

High Growth Yield of Single Multiwall Carbon Nanotube With Different Length Effect

Title
High Growth Yield of Single Multiwall Carbon Nanotube With Different Length Effect
Authors
Im, J[Im, Jaehan]Kim, S[Kim, Seunguk]Shin, JH[Shin, Jeong Hee]Choi, Y[Choi, Youngjin]Cha, SN[Cha, Seung Nam]Jang, JE[Jang, Jae Eun]
DGIST Authors
Im, J[Im, Jaehan]; Kim, S[Kim, Seunguk]; Shin, JH[Shin, Jeong Hee]; Jang, JE[Jang, Jae Eun]
Issue Date
2014-03
Citation
IEEE Transactions on Nanotechnology, 13(2), 316-321
Type
Article
Article Type
Article
Keywords
Aligned Single Multiwalled Carbon Nanotube (MWCNT)Carbon Nanotube (CNT)Carbon NanotubesCatalyst SizeCatalyst Size EffectCatalystsGrowth ConditionsHigh ProbabilityIntegration DensityLarge DeviationsMultiwalled Carbon Nanotubes (MWCN)Nano-Structured MaterialsNano-StructuresNanostructurePlasma Enhanced Chemical Vapor DepositionRoughness of SubstratesSurface RoughnessVertically Aligned
ISSN
1536-125X
Abstract
Vertically aligned single multiwalled carbon nanotube (MWCNT) is quite an interesting nanostructure due to its high probability of nanodevice realization with an ultrahigh integration density. Although &~200 nm catalyst diameter size and plasma-enhanced chemical vapor deposition (PECVD) method have been known as key parameters to grow a single MWCNT, the details and the phenomenon of below 200 nm catalyst size have not been studied or published well. Here, we report the details of catalyst size effect below 200 nm. One-hundred-nanometer diameter Ni catalyst on SiO2 layer shows 95% yield of single MWCNT growth. Surface roughness of substrate makes a large deviation in the yield and the critical catalyst size for single MWCNT. The various catalyst sizes result in the different growth rate of carbon nanotube (CNT) at the same growth condition. The change of diffusion surface area induces such a difference. From the results, single MWCNTs with various lengths are successfully grown on the same substrate by a one-step growth process. © 2014 IEEE.
URI
http://hdl.handle.net/20.500.11750/1588
DOI
10.1109/TNANO.2014.2302035
Publisher
Institute of Electrical and Electronics Engineers Inc.
Related Researcher
  • Author Jang, Jae Eun Advanced Electronic Devices Research Group(AEDRG)
  • Research Interests
Files:
There are no files associated with this item.
Collection:
Information and Communication EngineeringAdvanced Electronic Devices Research Group(AEDRG)1. Journal Articles


qrcode mendeley

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE