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dc.contributor.author Jeong, Jaewook -
dc.contributor.author Lee, Gwang Jun -
dc.contributor.author Kim, Joonwoo -
dc.contributor.author Jeong, Soon Moon -
dc.contributor.author Kim, Jung-Hye -
dc.date.available 2017-07-11T06:33:51Z -
dc.date.created 2017-04-10 -
dc.date.issued 2013-09-07 -
dc.identifier.issn 0021-8979 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/3205 -
dc.description.abstract We analyzed the temperature-dependent electrical characteristics of amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) using a gated-four-probe method (GFP) with temperatures ranging from 93 to 373 K. The intrinsic field-effect mobility and source/drain parasitic resistance were separately extracted using the GFP method. We found that temperature-dependent transfer characteristics originated from the temperature-dependent intrinsic field-effect mobility of the a-IGZO TFTs. The parasitic resistance was also correlated with the intrinsic-field effect mobility, which decreases as the intrinsic field-effect mobility increases, indicating that access parasitic resistance originated from bulk regions rather than metal/semiconductor junction barrier is a key factor to determine the parasitic resistance of a-IGZO TFTs. © 2013 AIP Publishing LLC. -
dc.publisher American Institute of Physics Publishing -
dc.title Analysis of temperature-dependent electrical characteristics in amorphous In-Ga-Zn-Othin-film transistors using gated-four-probe measurements -
dc.type Article -
dc.identifier.doi 10.1063/1.4819886 -
dc.identifier.scopusid 2-s2.0-84884951275 -
dc.identifier.bibliographicCitation Journal of Applied Physics, v.114, no.9 -
dc.subject.keywordPlus CONTACT RESISTANCE -
dc.subject.keywordPlus MOBILITY -
dc.subject.keywordPlus VOLTAGE -
dc.subject.keywordPlus TFT -
dc.citation.number 9 -
dc.citation.title Journal of Applied Physics -
dc.citation.volume 114 -
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Appears in Collections:
Division of Nanotechnology 1. Journal Articles
Division of Energy Technology 1. Journal Articles

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