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Heat Resistant Polymer Matrix Containing Acrylo-Polyhedral Silsesquioxane for Erbium-Doped Waveguide Amplifier Applications

Title
Heat Resistant Polymer Matrix Containing Acrylo-Polyhedral Silsesquioxane for Erbium-Doped Waveguide Amplifier Applications
Authors
Kim, WH[Kim, Wook Hyun]Sung, SJ[Sung, Shi-Joon]Choi, MS[Choi, Myung-Seok]Kim, JT[Kim, Jong Tae]Han, YS[Han, Yoon Soo]
DGIST Authors
Kim, WH[Kim, Wook Hyun]; Kim, JT[Kim, Jong Tae]
Issue Date
2013-01-01
Citation
Molecular Crystals and Liquid Crystals, 586(1), 33-42
Type
Article
Article Type
Article
Keywords
Acrylo-Polyhedral Oligomeric SilsesquioxaneCross-LinkingDecompositionErbiumErbium Doped Fiber AmplifiersErbium Doped Waveguide AmplifierFabricationFluorine Containing PolymersFluoropolymerHeat-Resistant PolymersMicromolding In CapillariesOligomersPolymer FilmsSemiconducting FilmsSilsesquioxanesSoft LithographySubstratesTransmission PropertyVisible and Near Infrared
ISSN
1542-1406
Abstract
We report on the fabrication of fluorinated polymer film as host material for erbium ions (Er3+) with a goal of achieving sufficient thermal stability, optical clarity and a chemical resistance to withstand typical fabrication processing. Precursor solutions were prepared using 2,2,3,3,4,4,5,5-octafluoropentyl acrylate as a fluoromonomer, tetrahydrofurfuryl acrylate as a solubility enhancer, Ebecryl 220 as a cross-linking agent, acrylo-polyhedral oligomeric silsesquioxane as a heat-resistance improver and Darocur 4265 as a radical photoinitiator with various weight ratios. Fluoropolymer films prepared from the precursor solution had excellent transmission properties (low transmission losses less than 2% over the visible and near-infrared regions) and high thermal decomposition temperatures (greater than 350 °C). Er3+-doped precursor solution was also prepared by adding of erbium(III) trifluoromethane sulfonate as an erbium source. The crosslinked, patterned and Er3+-doped fluoropolymer films were successfully fabricated using the Er3+-doped precursor solution by both micromolding in capillaries and soft-imprint lithography on glass substrates for Er3+-doped waveguide amplifier applications. © 2013 Copyright Taylor and Francis Group, LLC.
URI
http://hdl.handle.net/20.500.11750/3273
DOI
10.1080/15421406.2013.851457
Publisher
Taylor and Francis Ltd.
Files:
There are no files associated with this item.
Collection:
Convergence Research Center for Solar Energy1. Journal Articles
Division of Nano∙Energy Convergence Research1. Journal Articles


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