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dc.contributor.authorBae, Jae Yeonko
dc.contributor.authorJung, Jin Wooko
dc.contributor.authorPark, Hyo Yulko
dc.contributor.authorCho, Chang Heeko
dc.contributor.authorPark, Jin Heeko
dc.date.accessioned2018-01-11T12:46:06Z-
dc.date.available2018-01-11T12:46:06Z-
dc.date.created2018-01-01-
dc.date.issued2017-11-
dc.identifier.citationChemical Communications, v.53, no.89, pp.12100 - 12103-
dc.identifier.issn1359-7345-
dc.identifier.urihttp://hdl.handle.net/20.500.11750/4853-
dc.description.abstractDespite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture. © 2017 The Royal Society of Chemistry.-
dc.publisherRoyal Society of Chemistry-
dc.subjectMETAL-ORGANIC FRAMEWORKS-
dc.subjectROOM-TEMPERATURE-
dc.subjectCARBON-DIOXIDE-
dc.subjectACTIVATION-
dc.subjectADSORPTION-
dc.subjectSTABILITY-
dc.subjectWATER-
dc.subjectRESISTANT-
dc.subjectCAPTURE-
dc.subjectSTORAGE-
dc.titleOxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture-
dc.typeArticle-
dc.identifier.doi10.1039/c7cc05845d-
dc.identifier.wosid000414587100009-
dc.identifier.scopusid2-s2.0-85033364946-
dc.type.localArticle(Overseas)-
dc.type.rimsART-
dc.description.journalClass1-
dc.contributor.localauthorBae, Jae Yeon-
dc.contributor.localauthorJung, Jin Woo-
dc.contributor.localauthorCho, Chang Hee-
dc.contributor.localauthorPark, Jin Hee-
dc.contributor.nonIdAuthorPark, Hyo Yul-
dc.identifier.citationVolume53-
dc.identifier.citationNumber89-
dc.identifier.citationStartPage12100-
dc.identifier.citationEndPage12103-
dc.identifier.citationTitleChemical Communications-
dc.type.journalArticleArticle-
dc.description.isOpenAccessN-


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