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Issue Date	Title Author(s) Journal	View
2012-07-31	Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant Hong, TE[Hong, Tae Eun] ; Mun, KY[Mun, Ki-Yeung] ; Choi, SK[Choi, Sang-Kyung] ; Park, JY[Park, Ji-Yoon] ; Kim, SH[Kim, Soo-Hyun] ; Cheon, T[Cheon, Taehoon] ; Kim, WK[Kim, Woo Kyoung] ; Lim, BY[Lim, Byoung-Yong] ; Kim, S[Kim, Sunjung] ELSEVIER SCIENCE SA, 2012-07-31	525
2015	Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization Choi, Sang Kyung ; Kim, Han Gil ; Kim, Jun Beam ; Cheon, Tae Hoon ; Seo, Jong Hyun ; Kim, Soo Hyun Elsevier, 2015	552

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