https://scholar.dgist.ac.kr/handle/20.500.11750/59105 2026-06-10T00:27:07Z 2026-06-10T00:27:07Z Kim, Yu Na Kang, Eun Bin Kang, Yu Jin Lee, Junghoon Hong, Seung Sae Kim, Sung-Dae Jeong, Diana Lee, Min Sun Park, Woon Ik https://scholar.dgist.ac.kr/handle/20.500.11750/60360 2026-05-22T05:10:11Z 2026-03-31T15:00:00Z

Title: Extreme-Pressure Imprint-Directed Micropatterning of Self-Assembled Nanostructures Author(s): Kim, Yu Na; Kang, Eun Bin; Kang, Yu Jin; Lee, Junghoon; Hong, Seung Sae; Kim, Sung-Dae; Jeong, Diana; Lee, Min Sun; Park, Woon Ik Abstract: Extreme pressure imprint lithography (EPIL) offers a simple route to impart microscale geometries without thermal or chemical preconditioning, yet its integration with block copolymer (BCP) self-assembly remains relatively unexplored. Here we report an EPIL-directed micro- and nanopatterning strategy that couples mold-driven microscale confinement with thickness-dependent self-assembly of sphere-forming PS-b-PDMS thin films. When a spin-cast BCP film is imprinted with a rigid Si mold, the imposed height contrast, from a few nanometers on compressed mesas to tens of nanometers inside trenches, governs whether no pattern, monolayer, or double-layer nanostructures appear after thermal annealing and RIE treatment. On ductile Al substrates, simultaneous metal deformation and pressure-driven BCP redistribution create hierarchical patterns, in which polymer accumulation on the raised microfeatures after imprint release leads to selective formation of SiO x nanostructures. This EPIL-directed self-assembly approach provides large-area and shape-versatile patterning enabled by mechanically imposed confinement across rigid and ductile substrates, suggesting a broadly applicable route for hierarchical pattern engineering across multiple length scales.

2026-03-31T15:00:00Z