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Issue Date Title Author(s) Journal View
2020-09

Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method

Baik, Seunghun Kwon, Dong-Jae Kang, Hongki Jang, Jae Eun Jang, Jaewon Kim, Y. S. Kwon, Hyuk-Jun

IEEE Access, v.8, pp.172166 - 172174, 2020-09

471
2021-10

Kim, Dongsu Heo, Su Jin Pyo, Goeun Choi, Hongsoo Kwon, Hyuk-Jun Jang, Jae Eun

Institute of Electrical and Electronics Engineers Inc., 2021-10

456
1

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