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Issue Date Title Author(s) Journal View
2020-09

Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method

Baik, Seunghun Kwon, Dong-Jae Kang, Hongki Jang, Jae Eun Jang, Jaewon Kim, Y. S. Kwon, Hyuk-Jun

Institute of Electrical and Electronics Engineers Inc., 2020-09

452
2021-10

Kim, Dongsu Heo, Su Jin Pyo, Goeun Choi, Hongsoo Kwon, Hyuk-Jun Jang, Jae Eun

Institute of Electrical and Electronics Engineers Inc., 2021-10

368
2022-08

Jeong, Heejae Kim, Y. S. Baik, Seunghun Kang, Hongki Jang, Jae Eun Kwon, Hyuk-Jun

IEEE Electron Device Letters, v.43, no.8, pp.1315 - 1318, 2022-08

148
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