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Issue Date	Title Author(s) Journal	Views
2020	Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method Baik, Seunghun; Kwon, Dong-Jae; Kang, Hongki; Jang, Jae Eun; Jang, Jaewon; Kim, Y. S.; Kwon, Hyuk-Jun IEEE Access, 8, 172166-172174	382

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