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Visible Light Curing of Epon SU-8 Based Superparamagnetic Polymer Composites with Random and Ordered Particle Configurations

Title
Visible Light Curing of Epon SU-8 Based Superparamagnetic Polymer Composites with Random and Ordered Particle Configurations
Authors
Peters, C[Peters, Christian]Ergeneman, O[Ergeneman, Olgac]Sotiriou, GA[Sotiriou, Georgios A.]Choi, H[Choi, Hongsoo]Nelson, BJ[Nelson, Bradley J.]Hierold, C[Hierold, Christofer]
DGIST Authors
Choi, H[Choi, Hongsoo]
Issue Date
2015-01-14
Citation
ACS Applied Materials and Interfaces, 7(1), 193-200
Type
Article
Article Type
Article
Keywords
Composite MaterialsCuringDispersed NanoparticlesElectron Beam LithographyH-Nu 470Homogeneous Particle DistributionLightLight Sensitive MaterialsLithographyMagnetiteNanomagneticsNanoparticlesOrdered Magnetic StructuresPhotosensitivityPolymer CompositePolymer Matrix CompositesSaturation MagnetizationSuperparamagnetic Iron OxidesSuperparamagnetic Polymer CompositeSuperparamagnetic PropertySuperparamagnetismVisible-LightVisible-Light Curing
ISSN
1944-8244
Abstract
The performance of superparamagnetic polymer composite microdevices is highly dependent on the magnetic particle content. While high loading levels are desired for many applications, the UV absorption of these nanoparticles limits the overall thickness of the fabricated microstructures and subsequently their capability of magnetic interaction. The combination of a visible-light-sensitive photoinitiator and particle self-organization is proposed to extend the exposure depth limitation in Epon SU-8 based superparamagnetic polymer composites. While superparamagnetic iron oxide particles strongly absorb i-line radiation required to cross-link the Epon SU-8 polymer matrix, we propose the utilization of H-Nu 470 photoinitiator to expand the photosensitivity of the composite toward the visible spectrum, where the dispersed nanoparticles are more transparent. The novel photoinitiator preserves the composite's superparamagnetic properties as well as a homogeneous particle distribution. As a result, particle load or resist thickness can be more than doubled while maintaining exposure time. The self-organization of ordered magnetic structures allows for an additional increase in exposure depth of up to 40%, resulting in a 2.5-fold saturation magnetization. © 2014 American Chemical Society.
URI
http://hdl.handle.net/20.500.11750/1667
DOI
10.1021/am5056728
Publisher
American Chemical Society
Related Researcher
  • Author Choi, Hong Soo Bio-Micro Robotics Lab
  • Research Interests Micro/Nano robot; Neural prostheses; MEMS; BMI; MEMS/NEMS; BioMEMS; MEMS 초음파 트랜스듀스; 인공와우
Files:
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Collection:
Robotics EngineeringETC1. Journal Articles


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