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dc.contributor.author Jeong, Jaewook -
dc.contributor.author Lee, Gwang Jun -
dc.contributor.author Kim, Joonwoo -
dc.contributor.author Kim, Jung-Hye -
dc.contributor.author Choi, Byeongdae -
dc.date.available 2017-07-11T06:38:00Z -
dc.date.created 2017-04-10 -
dc.date.issued 2013-02 -
dc.identifier.issn 0268-1242 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/3265 -
dc.description.abstract We demonstrate high operating voltage transparent thin-film transistors (HVTTFTs) using amorphous InGaZnO (a-IGZO) active layers by introducing a high resistance bulk region in the source/drain electrodes. The HVTTFTs are operated at above VDS = 100 V with a high on/off current ratio and a good subthreshold slope. The electrical characteristics of the HVTTFTs were dominantly affected by Schottky contact resistance for small off-set length, and bulk resistance for large off-set length, indicating that optimization of the off-set length is a key factor to realize high performance HVTTFTs. © 2013 IOP Publishing Ltd. -
dc.publisher Institute of Physics Publishing -
dc.title High operating voltage application of transparent a-InGaZnO thin-film transistors -
dc.type Article -
dc.identifier.doi 10.1088/0268-1242/28/2/025015 -
dc.identifier.scopusid 2-s2.0-84872978899 -
dc.identifier.bibliographicCitation Semiconductor Science and Technology, v.28, no.2 -
dc.citation.number 2 -
dc.citation.title Semiconductor Science and Technology -
dc.citation.volume 28 -
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Appears in Collections:
Division of Nanotechnology 1. Journal Articles
Division of Electronics & Information System 1. Journal Articles

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