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dc.contributor.author Chung, JW[Chung, Jin-Won] ko
dc.contributor.author Park, JW[Park, Jun Woong] ko
dc.contributor.author Lee, YJ[Lee, Yu Jin] ko
dc.contributor.author Ahn, SW[Ahn, Seh-Won] ko
dc.contributor.author Lee, HM[Lee, Heon-Min] ko
dc.contributor.author Park, OO[Park, O. Ok] ko
dc.date.available 2017-07-11T06:52:52Z -
dc.date.created 2017-04-10 -
dc.date.issued 2012-10 -
dc.identifier.citation Japanese Journal of Applied Physics, v.51, no.10 -
dc.identifier.issn 0021-4922 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/3327 -
dc.description.abstract Hydrogenated amorphous silicon-germanium (a-SiGe:H) solar cells are fabricated with different thicknesses of the i/n graded layer and profiling shapes for appropriate band gap profiling. Comparison of the solar parameters between the U-shape profiling and the exponential shape (E-shape) profiling has been carried out at the same total thickness. In the U-shape profiling, as the thickness of the i/n graded layer increase, the fill factor (FF) and open circuit voltage (V oc) of p-i-n single-junction a-SiGe:H solar cells increase, but the short circuit current (J sc) of cells decreases. In the E-shape profiling, the J sc of the a-SiGe:H cell is enhanced without significant losses in V oc. For further analysis, a modified E-shape profiling is incorporated in a-Si:H/a-SiGe:H double-junction cells, which has resulted in the improvement of V oc and FF of doublejunction cells to 1.67 V and 0.753, respectively, without significant reduction in J sc,SiGe QE, 12.58 mA/cm 2. © 2012 The Japan Society of Applied Physics. -
dc.publisher Institute of Physics Publishing -
dc.subject A-Si:H -
dc.subject Amorphous Silicon -
dc.subject Fill-Factor -
dc.subject Graded Layers -
dc.subject Hydrogenation -
dc.subject Open Circuit Voltage -
dc.subject Silicon Alloys -
dc.subject Silicon Germanium -
dc.subject Solar Cells -
dc.subject Solar Parameters -
dc.title Graded Layer Modification for High Efficiency Hydrogenated Amorphous Silicon-Germanium Solar Cells -
dc.type Article -
dc.identifier.doi 10.1143/JJAP.51.10NB16 -
dc.identifier.wosid 000310707800034 -
dc.identifier.scopusid 2-s2.0-84869130080 -
dc.type.local Article(Overseas) -
dc.type.rims ART -
dc.description.journalClass 1 -
dc.contributor.nonIdAuthor Chung, JW[Chung, Jin-Won] -
dc.contributor.nonIdAuthor Park, JW[Park, Jun Woong] -
dc.contributor.nonIdAuthor Lee, YJ[Lee, Yu Jin] -
dc.contributor.nonIdAuthor Ahn, SW[Ahn, Seh-Won] -
dc.contributor.nonIdAuthor Lee, HM[Lee, Heon-Min] -
dc.identifier.citationVolume 51 -
dc.identifier.citationNumber 10 -
dc.identifier.citationTitle Japanese Journal of Applied Physics -
dc.type.journalArticle Article -
dc.contributor.affiliatedAuthor Park, OO[Park, O. Ok] -
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