Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jang, Hwan Soo | - |
dc.contributor.author | Choi, Ho-Jin | - |
dc.contributor.author | Oh, Byeong-Yun | - |
dc.contributor.author | Kim, Jae Hyun | - |
dc.date.available | 2017-07-11T07:07:33Z | - |
dc.date.created | 2017-04-10 | - |
dc.date.issued | 2011 | - |
dc.identifier.issn | 1099-0062 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11750/3483 | - |
dc.description.abstract | Ordered porous silicon and silicon wire arrays are conventionally fabricated by electrochemical etching in an electrolyte incorporating hydrofluoric acid through formation of a periodical etch pit with an inversed pyramid shape created by KOH etching depending on the crystal orientation of silicon. We propose a new process to form an etch pit using metal-assisted chemical etching, which is not dependent on the crystal orientation of the silicon substrate. The proposed process involves a simpler electrochemical etching process and lower manufacturing cost. Furthermore, it is exploited to produce p-type silicon wire arrays with aspect ratio of more than 5. © 2010 The Electrochemical Society. | - |
dc.publisher | Electrochemical and Solid-State | - |
dc.title | Combinational Approach of Electrochemical Etching and Metal-Assisted Chemical Etching for p-Type Silicon Wire Formation | - |
dc.type | Article | - |
dc.identifier.doi | 10.1149/1.3504127 | - |
dc.identifier.wosid | 000284317600010 | - |
dc.identifier.scopusid | 2-s2.0-78751472065 | - |
dc.identifier.bibliographicCitation | Electrochemical and Solid State Letters, v.14, no.1, pp.D5 - D9 | - |
dc.subject.keywordPlus | ABSORPTION | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | Aspect Ratio | - |
dc.subject.keywordPlus | Crystal Orientation | - |
dc.subject.keywordPlus | Electrochemical Etching | - |
dc.subject.keywordPlus | Etch Pits | - |
dc.subject.keywordPlus | Fabrication | - |
dc.subject.keywordPlus | Hydrofluoric ACID | - |
dc.subject.keywordPlus | Koh Etching | - |
dc.subject.keywordPlus | MACROPORE FORMATION | - |
dc.subject.keywordPlus | Manufacturing Cost | - |
dc.subject.keywordPlus | Metal-Assisted Chemical Etching | - |
dc.subject.keywordPlus | New Process | - |
dc.subject.keywordPlus | P-Type Silicon | - |
dc.subject.keywordPlus | Photonic Crystals | - |
dc.subject.keywordPlus | Photovoltaic Applications | - |
dc.subject.keywordPlus | Porous Silicon | - |
dc.subject.keywordPlus | Potassium Hydroxide | - |
dc.subject.keywordPlus | Silicon Substrates | - |
dc.subject.keywordPlus | Silicon Wires | - |
dc.subject.keywordPlus | Wire | - |
dc.citation.endPage | D9 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | D5 | - |
dc.citation.title | Electrochemical and Solid State Letters | - |
dc.citation.volume | 14 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Electrochemistry; Materials Science | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry; Materials Science, Multidisciplinary | - |
dc.type.docType | Article | - |
There are no files associated with this item.