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Issue Date	Title Author(s) Journal	View
2015	Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization Choi, Sang Kyung ; Kim, Han Gil ; Kim, Jun Beam ; Cheon, Tae Hoon ; Seo, Jong Hyun ; Kim, Soo Hyun Elsevier, 2015	553
2017-10	Magnetism of the hypo-oxide state at the diffuse interface between the ferromagnet and antiferromagnet phases Jung, Min-Seung ; Im, Mi-Young ; Lee, Bong Ho ; Kim, Namkyu ; Lee, Ki-Suk ; Hong, Jung-Il Royal Society of Chemistry, 2017-10	845
2019-11	Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery Nandi, Dip K. ; Yeo, Seungmin ; Ansari, Mohd Zahid ; Sinha, Soumyadeep ; Cheon, Taehoon ; Kwon, Jiseok ; Kim, Hyungjun ; Heo, Jaeyeong ; Song, Taeseup ; Kim, Soo-Hyun Elsevier Ltd, 2019-11	556
2019-05	Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction Ramesh, Rahul ; Nandi, Dip K. ; Kim, Tae Hyun ; Cheon, Taehoon ; Oh, Jihun ; Kim, Soo-Hyun American Chemical Society, 2019-05	549

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