Showing results 1 to 6 of 6
- 2024-05
- Baik, Seunghun. (2024-05). Heavily phosphorus doped germanium with local strain compensation effect by Co-implantation and rapid thermal process. Journal of Alloys and Compounds, 984. doi: 10.1016/j.jallcom.2024.173952
- Elsevier
- View : 220
- Download : 0
- 2022-08
- Jeong, Heejae. (2022-08). High and Uniform Phosphorus Doping in Germanium through a Modified Plasma Assisted Delta Doping Process with H2 Plasma Treatment. IEEE Electron Device Letters, 43(8), 1315–1318. doi: 10.1109/LED.2022.3182730
- Institute of Electrical and Electronics Engineers
- View : 597
- Download : 0
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Park, Jongyoun
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Jeong, Heejae
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Park, Euyjin
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Park, Geuntae
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Ahn, Chunghyun
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Lee, Sangsu
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Kwon, Hyuk-Jun
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Yu, Hyun-Yong
- 2025-06-12
- 2025 Symposium on VLSI Technology and Circuits, pp.1 - 3
- Institute of Electrical and Electronics Engineers
- View : 243
- Download : 0
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Baek, Jongyeon
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Kim, Seung-Hwan
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Jeong, Heejae
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Nguyen, Manh-Cuong
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Baek, Daeyoon
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Baik, Seunghun
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Nguyen, An Hoang-Thuy
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Baek, Jong-Hwa
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Kim, Hyung-jun
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Kwon, Hyuk-Jun
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et al
- 2023-01
- Baek, Jongyeon. (2023-01). Low-temperature laser crystallization of Ge layers grown on MgO substrates. Applied Surface Science, 609. doi: 10.1016/j.apsusc.2022.155368
- Elsevier B.V.
- View : 402
- Download : 0
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Kim, Dongsu
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Jeong, Heejae
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Pyo, Goeun
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Heo, Su Jin
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Baik, Seunghun
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Kim, Seonhyoung
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Choi, Hong Soo
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Kwon, Hyuk-Jun
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Jang, Jae Eun
- 2024-07
- Kim, Dongsu. (2024-07). Low-Temperature Nanosecond Laser Process of HZO-IGZO FeFETs toward Monolithic 3D System on Chip Integration. Advanced Science, 11(28). doi: 10.1002/advs.202401250
- Wiley
- View : 358
- Download : 0
- 2023-11
- Baik, Seunghun. (2023-11). Reducing Specific Contact Resistivity for n-type Germanium using Laser Activation Process and Nano-island Formation. Applied Surface Science, 638. doi: 10.1016/j.apsusc.2023.157967
- Elsevier BV
- View : 510
- Download : 91
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