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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Article
Direct monitoring of generated particles in plasma enhanced chemical vapor deposition process using temperature compensating quartz crystal microbalance
  • Jang, Il Ryu ; 
  • Kim, Hyeong-U ; 
  • Kim, Taehoon ; 
  • Kweun, Minwoo ; 
  • Eom, Geon Woong ; 
  • Park, In Yong ; 
  • Lee, Sangho ; 
  • Kim, Seongho ; 
  • Kang, Minji ; 
  • Park, Kyeong Jun ; 
    • et al
  • 2025-03
  • Jang, Il Ryu. (2025-03). Direct monitoring of generated particles in plasma enhanced chemical vapor deposition process using temperature compensating quartz crystal microbalance. Sensors and Actuators A: Physical, 383. doi: 10.1016/j.sna.2024.116181
  • Elsevier
  • View : 166
  • Download : 0

Machine Learning Based on Digital Image Colorimetry Driven In Situ, Noncontact Plasma Etch Depth Prediction

Article
Machine Learning Based on Digital Image Colorimetry Driven In Situ, Noncontact Plasma Etch Depth Prediction
  • Kang, Minji ; 
  • Kim, Seongho ; 
  • Go, Eunseo ; 
  • Paek, Donghyeon ; 
  • Lim, Geon ; 
  • Kim, Muyoung ; 
  • Kim, Changmin ; 
  • Kim, Soyeun ; 
  • Jang, Sung Kyu ; 
  • Bak, Moon Soo ; 
    • et al
  • 2026-01
  • Advanced Intelligent Systems, v.8, no.1
  • Wiley
  • View : 64
  • Download : 16
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