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Showing results 1 to 8 of 8

Article
Advanced Atomic Layer Modulation Based Highly Homogeneous PtRu Precious Metals Alloy Thin Films
  • Son, Yeseul ; 
  • Kim, Sang Bok ; 
  • Mohapatra, Debananda ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2025-08
  • Advanced Science, v.12, no.29
  • Wiley
  • View : 113
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Article
Direct and controlled device integration of graphene oxide on Quartz Crystal Microbalance via electrospray deposition for stable humidity sensing
  • Jang, Ilryu ; 
  • Jung, Soon In ; 
  • Park, Jeonhyeong ; 
  • Ryu, Chaehyun ; 
  • Park, Inyong ; 
  • Kim, Sang Bok ; 
  • Kim, Hoe Joon
  • 2022-03
  • Jang, Ilryu. (2022-03). Direct and controlled device integration of graphene oxide on Quartz Crystal Microbalance via electrospray deposition for stable humidity sensing. Ceramics International, 48(6), 8004–8011. doi: 10.1016/j.ceramint.2021.11.347
  • Pergamon Press Ltd.
  • View : 496
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Article
High Precision Liquid Salinity Sensing using a CNT coated Quartz Crystal Microbalance
  • Jang, Il Ryu ; 
  • Park, Jeonhyeong ; 
  • Ryu, Chaehyun ; 
  • Jung, Soon In ; 
  • Kim, Hyo Na ; 
  • Kim, Sang Bok ; 
  • Kim, Hoe Joon
  • 2022-04
  • Jang, Il Ryu. (2022-04). High Precision Liquid Salinity Sensing using a CNT coated Quartz Crystal Microbalance. IEEE Sensors Journal, 22(8), 7684–7691. doi: 10.1109/JSEN.2022.3157465
  • Institute of Electrical and Electronics Engineers
  • View : 617
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Conference
Improved Properties of Atomic Layer Deposited Ru Films by Providing Additional Reactant for Cu Alternative Nanoscale Interconnects
  • Kim, Jeongha ; 
  • Mohapatra, Debananda ; 
  • Son, Yeseul ; 
  • Jang, Jae Min ; 
  • Kim, Sang Bok ; 
  • Cheon, Taehoon ; 
  • Shong, Boggeun ; 
  • Kim, Soo-Hyun
  • 2025-06-04
  • International Interconnect Technology Conference, IITC 2025, pp.1 - 3
  • Korean Institute of Electrical and Electronic Material Engineers(한국전기전자재료학회)
  • View : 19
  • Download : 0
Article
New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition
  • Ansari, Mohd Zahid ; 
  • Janicek, Petr ; 
  • Namgung, Sook ; 
  • Kim, Hyangil ; 
  • Nandi, Dip K. ; 
  • Cheon, Taehoon ; 
  • Siddiqui, Masoom Raza ; 
  • Imran, Muhammad ; 
  • Jang, Yujin ; 
  • Bae, Jong-Seong ; 
    • et al
  • 2024-03
  • Ansari, Mohd Zahid. (2024-03). New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition. Surfaces and Interfaces, 46. doi: 10.1016/j.surfin.2024.104014
  • Elsevier
  • View : 309
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Conference
Plasma-Enhanced Atomic Layer Deposition of Yttrium Carbide Thin Films as a Promising Transition Metal Carbide for Dual Diffusion Barrier in Cu and Ru Metallization
  • Kweon, Minjeong ; 
  • Park, Chaehyun ; 
  • Mohapatra, Debananda ; 
  • Kim, Sang Bok ; 
  • Bae, Jong-Seong ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2025-06-04
  • International Interconnect Technology Conference, IITC 2025, pp.1 - 3
  • Korean Institute of Electrical and Electronic Material Engineers(한국전기전자재료학회)
  • View : 18
  • Download : 0
Article
Quartz crystal microbalance with thermally-controlled surface adhesion for an efficient fine dust collection and sensing
  • Jang, Il Ryu ; 
  • Jung, Soon In ; 
  • Lee, Gunhee ; 
  • Park, Inyong ; 
  • Kim, Sang Bok ; 
  • Kim, Hoe Joon
  • 2022-02
  • Jang, Il Ryu. (2022-02). Quartz crystal microbalance with thermally-controlled surface adhesion for an efficient fine dust collection and sensing. Journal of Hazardous Materials, 424. doi: 10.1016/j.jhazmat.2021.127560
  • Elsevier
  • View : 494
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Article
Yttrium carbide thin film as an emerging transition metal carbide Prepared by plasma-enhanced atomic layer deposition for Dual diffusion barrier applications into Cu and Ru metallization
  • Kweon, Minjeong ; 
  • Park, Chaehyun ; 
  • Mohapatra, Debananda ; 
  • Kim, Sang Bok ; 
  • Bae, Jong-Seong ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2025-08
  • Kweon, Minjeong. (2025-08). Yttrium carbide thin film as an emerging transition metal carbide Prepared by plasma-enhanced atomic layer deposition for Dual diffusion barrier applications into Cu and Ru metallization. Applied Surface Science, 701. doi: 10.1016/j.apsusc.2025.163302
  • Elsevier
  • View : 85
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