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Conference
Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect
  • Kim, Youn-Hye ; 
  • Kotsugi, Yohei ; 
  • Cheon, Taehoon ; 
  • Ramesh, Rahul ; 
  • Kim, Soo-Hyun
  • 2021-07-06
  • Kim, Youn-Hye. (2021-07-06). Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect. 24th Annual IEEE International Interconnect Technology Conference, IITC 2021. doi: 10.1109/IITC51362.2021.9537498
  • Institute of Electrical and Electronics Engineers Inc.
  • View : 186
  • Download : 0
Article
Atomic Layer Modulation of Ruthenium Aluminum Oxide through Reactivity Control of Precursors for Seedless Copper Interconnects
  • Nguyen, Chi Thang ; 
  • Kim, Miso ; 
  • Kim, Youn-Hye ; 
  • Cheon, Taehoon ; 
  • Trinh, Ngoc Le ; 
  • Kim, Sehee ; 
  • Kim, Soo-Hyun ; 
  • Shong, Bonggeun ; 
  • Lee, Han-Bo-Ram
  • 2025-12
  • Chemistry of Materials, v.37, no.24, pp.9745 - 9757
  • American Chemical Society
  • View : 80
  • Download : 0

Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring

Article
Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring
  • Mohapatra, Debananda ; 
  • Shin, Yujin ; 
  • Ansari, Mohd Zahid ; 
  • Kim, Youn-Hye ; 
  • Park, Ye Jin ; 
  • Cheon, Taehoon ; 
  • Kim, Haekyoung ; 
  • Lee, Jung Woo ; 
  • Kim, Soo-Hyun
  • 2023-04
  • Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
  • John Wiley and Sons Inc
  • View : 213
  • Download : 73
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