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Issue Date	Title Author(s) Journal	View
2021-07-06	Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect Kim, Youn-Hye ; Kotsugi, Yohei ; Cheon, Taehoon ; Ramesh, Rahul ; Kim, Soo-Hyun 24th Annual IEEE International Interconnect Technology Conference, IITC 2021, 2021-07-06	18
2023-04	Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring Mohapatra, Debananda ; Shin, Yujin ; Ansari, Mohd Zahid ; Kim, Youn-Hye ; Park, Ye Jin ; Cheon, Taehoon ; Kim, Haekyoung ; Lee, Jung Woo ; Kim, Soo-Hyun Advanced Science, v.10, no.12, 2023-04	34

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