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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Conference
Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect
  • Kim, Youn-Hye ; 
  • Kotsugi, Yohei ; 
  • Cheon, Taehoon ; 
  • Ramesh, Rahul ; 
  • Kim, Soo-Hyun
  • 2021-07-06
  • Kim, Youn-Hye. (2021-07-06). Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect. 24th Annual IEEE International Interconnect Technology Conference, IITC 2021. doi: 10.1109/IITC51362.2021.9537498
  • Institute of Electrical and Electronics Engineers Inc.
  • View : 148
  • Download : 0

Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring

Article
Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring
  • Mohapatra, Debananda ; 
  • Shin, Yujin ; 
  • Ansari, Mohd Zahid ; 
  • Kim, Youn-Hye ; 
  • Park, Ye Jin ; 
  • Cheon, Taehoon ; 
  • Kim, Haekyoung ; 
  • Lee, Jung Woo ; 
  • Kim, Soo-Hyun
  • 2023-04
  • Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
  • John Wiley and Sons Inc
  • View : 153
  • Download : 45
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