Showing results 1 to 2 of 2
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Kim, Youn-Hye
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Kotsugi, Yohei
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Cheon, Taehoon
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Ramesh, Rahul
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Kim, Soo-Hyun
- 2021-07-06
- Kim, Youn-Hye. (2021-07-06). Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect. 24th Annual IEEE International Interconnect Technology Conference, IITC 2021. doi: 10.1109/IITC51362.2021.9537498
- Institute of Electrical and Electronics Engineers Inc.
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- Download : 0
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Mohapatra, Debananda
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Shin, Yujin
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Ansari, Mohd Zahid
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Kim, Youn-Hye
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Park, Ye Jin
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Cheon, Taehoon
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Kim, Haekyoung
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Lee, Jung Woo
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Kim, Soo-Hyun
- 2023-04
- Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
- John Wiley and Sons Inc
- View : 130
- Download : 31
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