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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Conference
Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect
  • Kim, Youn-Hye ; 
  • Kotsugi, Yohei ; 
  • Cheon, Taehoon ; 
  • Ramesh, Rahul ; 
  • Kim, Soo-Hyun
  • 2021-07-06
  • Kim, Youn-Hye. (2021-07-06). Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect. 24th Annual IEEE International Interconnect Technology Conference, IITC 2021. doi: 10.1109/IITC51362.2021.9537498
  • Institute of Electrical and Electronics Engineers Inc.
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Article
Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization
  • Nakazawa, Tatsuya ; 
  • Kim, Donghyun ; 
  • Kim, Jaehyeok ; 
  • Kotsugi, Yohei ; 
  • Cheon, Taehoon ; 
  • Chung, Seung-Min ; 
  • Kim, Soo-Hyun ; 
  • Kim, Hyungjun
  • 2022-09
  • Nakazawa, Tatsuya. (2022-09). Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization. Rare Metals, 41(9), 3086–3099. doi: 10.1007/s12598-022-02012-2
  • University of Science and Technology Beijing
  • View : 336
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