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Showing results 1 to 5 of 5

  • Son, Yeseul
  • Kim, Sang Bok
  • Mohapatra, Debananda
  • Cheon, Taehoon
  • Kim, Soo-Hyun
  • 2025-08
  • Advanced Science, v.12, no.29
  • Wiley
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  • Park, Chaehyun
  • Kweon, Minjeong
  • Mohapatra, Debananda
  • Cheon, Taehoon
  • Bae, Jong-Seong
  • Jeong, Daeyoon
  • Jang, Hyunwoo
  • Shim, Seungwon
  • Park, Young-Bae
  • Kang, Youngho
  • et al
  • 2025-06
  • Park, Chaehyun. (2025-06). Highly Conductive Ultrathin Niobium Carbide Thin Films as Next-Generation Diffusion Barriers for Cu and Ru Interconnects Prepared by Plasma-Enhanced Atomic Layer Deposition. Chemistry of Materials, 37(13), 4743–4757. doi: 10.1021/acs.chemmater.5c00557
  • American Chemical Society
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  • Mohapatra, Debananda
  • Byun, Jeong Eun
  • Ansari, Mohd Zahid
  • Kim, Haekyoung
  • Cheon, Taehoon
  • Jang, Jongmoon
  • Cho, Young-Rae
  • Lee, Jung Woo
  • Kim, Soo-Hyun
  • 2023-12
  • Mohapatra, Debananda. (2023-12). Layer Engineered MXene Empowered Wearable Pressure Sensors for Non-Invasive Vital Human–Machine Interfacing Healthcare Monitoring. Advanced Materials Technologies, 8(24). doi: 10.1002/admt.202301175
  • Wiley
  • View : 66
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Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring

  • Mohapatra, Debananda
  • Shin, Yujin
  • Ansari, Mohd Zahid
  • Kim, Youn-Hye
  • Park, Ye Jin
  • Cheon, Taehoon
  • Kim, Haekyoung
  • Lee, Jung Woo
  • Kim, Soo-Hyun
  • 2023-04
  • Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
  • John Wiley and Sons Inc
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  • Kweon, Minjeong
  • Park, Chaehyun
  • Mohapatra, Debananda
  • Kim, Sang Bok
  • Bae, Jong-Seong
  • Cheon, Taehoon
  • Kim, Soo-Hyun
  • 2025-08
  • Kweon, Minjeong. (2025-08). Yttrium carbide thin film as an emerging transition metal carbide Prepared by plasma-enhanced atomic layer deposition for Dual diffusion barrier applications into Cu and Ru metallization. Applied Surface Science, 701. doi: 10.1016/j.apsusc.2025.163302
  • Elsevier
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