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Article
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect
  • Mun, Ki-Yeung ; 
  • Hong, Tae Eun ; 
  • Cheon, Taehoon ; 
  • Jang, Yujin ; 
  • Lim, Byoung-Yong ; 
  • Kim, Sunjung ; 
  • Kim, Soo-Hyun
  • 2014-07-01
  • Mun, Ki-Yeung. (2014-07-01). The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect. Thin Solid Films, 562, 118–125. doi: 10.1016/j.tsf.2014.03.088
  • Elsevier
  • View : 746
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Article
Versatile Tunability of the Metal Insulator Transition in (TiO2)m/(VO2)m Superlattices
  • Eres, Gyula ; 
  • Lee, Shinbuhm ; 
  • Nichols, John ; 
  • Sohn, Changhee ; 
  • Ok, Jong Mok ; 
  • Mazza, Alessandro R. ; 
  • Liu, Chenze ; 
  • Duscher, Gerd ; 
  • Lee, Ho Nyung ; 
  • McNally, Daniel E. ; 
    • et al
  • 2020-12
  • Eres, Gyula. (2020-12). Versatile Tunability of the Metal Insulator Transition in (TiO2)m/(VO2)m Superlattices. Advanced Functional Materials, 30(51), 2004914. doi: 10.1002/adfm.202004914
  • John Wiley & Sons Ltd.
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