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Showing results 1 to 1 of 1
Issue Date
Title
Author(s)
Article
High and Uniform Phosphorus Doping in Germanium through a Modified Plasma Assisted Delta Doping Process with H2 Plasma Treatment
Jeong, Heejae
;
Kim, Y. S.
;
Baik, Seunghun
;
Kang, Hongki
;
Jang, Jae Eun
;
Kwon, Hyuk-Jun
2022-08
Jeong, Heejae. (2022-08). High and Uniform Phosphorus Doping in Germanium through a Modified Plasma Assisted Delta Doping Process with H2 Plasma Treatment. IEEE Electron Device Letters, 43(8), 1315–1318. doi: 10.1109/LED.2022.3182730
Institute of Electrical and Electronics Engineers
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