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Article
Functionalization of Si3N4 with an aldehyde inhibitor for area selective deposition of HfO2 and SiO2
  • Lee, Byungchan ; 
  • Shim, Seungwon ; 
  • Trinh, Ngoc Le ; 
  • Patil, Aravind H. ; 
  • Nguyen, Chi Thang ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun ; 
  • Kang, Youngho ; 
  • Lee, Han-Bo-Ram
  • 2025-09
  • Journal of Materials Chemistry C, v.13, no.37, pp.19316 - 19329
  • Royal Society of Chemistry
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