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Nonconventional Strain Engineering for Uniform Biaxial Tensile Strain in MoS2 Thin Film Transistors
  • Shin, Heechang ; 
  • Katiyar, Ajit Kumar ; 
  • Hoang, Anh Tuan ; 
  • Yun, Seok Min ; 
  • Kim, Beom Jin ; 
  • Lee, Gwanjin ; 
  • Kim, Youngjae ; 
  • Lee, JaeDong ; 
  • Kim, Hyunmin ; 
  • Ahn, Jong-Hyun
  • 2024-01
  • Shin, Heechang. (2024-01). Nonconventional Strain Engineering for Uniform Biaxial Tensile Strain in MoS2 Thin Film Transistors. ACS Nano, 18(5), 4414–4423. doi: 10.1021/acsnano.3c10495
  • American Chemical Society
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