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Electrical characterization of graphene source/drain electrodes in amorphous indium-gallium-zinc-oxide thin-film transistors subjected to plasma treatment in contact regions
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dc.contributor.author Jeong, Jaewook ko
dc.contributor.author Kim, Joonwoo ko
dc.date.accessioned 2019-07-11T05:54:48Z -
dc.date.available 2019-07-11T05:54:48Z -
dc.date.created 2019-07-11 -
dc.date.issued 2019-07 -
dc.identifier.citation Japanese Journal of Applied Physics, v.58, no.7, pp.071003 -
dc.identifier.issn 0021-4922 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/10118 -
dc.description.abstract In this paper, the electrical characteristics of a-IGZO TFTs with graphene source/drain (S/D) electrodes subjected to argon plasma treatment are analyzed. Depending on the channel length (L), the a-IGZO TFTs showed parasitic resistance dominant (L < 30 μm) and channel conduction dominant regions (L ≥ 30 μm). Using the transmission line method, the intrinsic parameters were extracted. The intrinsic field-effect mobility was about 9.79 cm2 V-1 s-1 and the width-normalized parasitic resistance value was about 460 Ωcm, which are comparable with those of a-IGZO TFTs having S/D plasma-treated regions with no contact metal. Temperature-dependent measurement indicates that the graphene electrodes affected the thermally deactivated behavior of the a-IGZO TFTs, which is different from the case of a-IGZO TFTs having conventional metal electrodes. © 2019 The Japan Society of Applied Physics. -
dc.language English -
dc.publisher Institute of Physics Publishing -
dc.title Electrical characterization of graphene source/drain electrodes in amorphous indium-gallium-zinc-oxide thin-film transistors subjected to plasma treatment in contact regions -
dc.type Article -
dc.identifier.doi 10.7567/1347-4065/ab24fe -
dc.identifier.wosid 000472754400001 -
dc.identifier.scopusid 2-s2.0-85070735833 -
dc.type.local Article(Overseas) -
dc.type.rims ART -
dc.identifier.bibliographicCitation Jeong, Jaewook. (2019-07). Electrical characterization of graphene source/drain electrodes in amorphous indium-gallium-zinc-oxide thin-film transistors subjected to plasma treatment in contact regions. doi: 10.7567/1347-4065/ab24fe -
dc.description.journalClass 1 -
dc.contributor.nonIdAuthor Jeong, Jaewook -
dc.identifier.citationVolume 58 -
dc.identifier.citationNumber 7 -
dc.identifier.citationStartPage 071003 -
dc.identifier.citationTitle Japanese Journal of Applied Physics -
dc.type.journalArticle Article -
dc.description.isOpenAccess N -
dc.contributor.affiliatedAuthor Kim, Joonwoo -
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