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Determination of Dimension and Conformal Arsenic Doping Profile of a Fin Field Effect Transistors by Time-of-Flight Medium Energy Ion Scattering

Title
Determination of Dimension and Conformal Arsenic Doping Profile of a Fin Field Effect Transistors by Time-of-Flight Medium Energy Ion Scattering
Authors
Min, Won JaKim, JwasoonPark, KyungsuMarmitt, GabrielEngland, JonathanMoon, DaeWon
Issue Date
2019-07
Citation
Analytical Chemistry, 91(14), 9315-9322
Type
Article
Article Type
Article
Keywords
DOPANT
ISSN
0003-2700
Abstract
We have developed a methodology that analyzes the dimensions and conformal doping profiles in fin field effect transistors (FinFET) using time-of-flight medium energy ion scattering (TOF-MEIS). The structure of a 3D FinFET and As dopant profiles were determined by comprehensive simulations of TOF-MEIS measurements made in three different scattering geometries. The width and height of a FinFET and the As doping profiles in the top, side, and bottom of fin were analyzed simultaneously. The results showed the dimension and conformal doping profile of nanostructures with complex shape can be determined by TOF-MEIS nondestructively, quantitatively, and with subnm depth resolution without any sputtering and matrix effects. © 2019 American Chemical Society.
URI
http://hdl.handle.net/20.500.11750/10401
DOI
10.1021/acs.analchem.9b02687
Publisher
American Chemical Society
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