Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김준우 | - |
dc.contributor.author | 이광준 | - |
dc.contributor.author | 정재욱 | - |
dc.contributor.author | 최병대 | - |
dc.date.accessioned | 2021-04-26T07:01:35Z | - |
dc.date.available | 2021-04-26T07:01:35Z | - |
dc.date.created | 2018-03-29 | - |
dc.date.issued | 2012-06 | - |
dc.identifier.citation | 대한전자공학회, v.35, no.1, pp.269 - 271 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11750/13398 | - |
dc.identifier.uri | http://www.dbpia.co.kr/Journal/PDFViewNew?id=NODE02275002&prevPathCode= | - |
dc.description.abstract | In this study, we investigated the electrical characteristics of transparent amorphous indium gallium zinc oxide (a-IGZO) TFT in short channel region. In order to reduce the contact resistance, Ar plasma treatment was performed on the source drain region of a-IGZO TFT. The contact resistance of a-IGZO thin film was reduced from 330 ȳȒ㎝ to 150 ȳȒ㎝ after Ar plasma treatment. Upon their exposure to Ar plasma, carrier concentraion of the a-IGZO thin films was increased due to the increase of oxygen vacancy. | - |
dc.language | Korean | - |
dc.publisher | 대한전자공학회 | - |
dc.title | Source / Drain 투명 전극을 적용한 a-IGZO TFT의 Ar Plasma 처리 효과 | - |
dc.title.alternative | Effect on Ar Plasma Treatment for a-IGZO TFT with Transparent Source/Drain Electrodes | - |
dc.type | Article | - |
dc.type.local | Article(Domestic) | - |
dc.type.rims | ART | - |
dc.description.journalClass | 2 | - |
dc.citation.publicationname | 대한전자공학회 | - |
dc.contributor.nonIdAuthor | 김준우 | - |
dc.contributor.nonIdAuthor | 이광준 | - |
dc.identifier.citationVolume | 35 | - |
dc.identifier.citationNumber | 1 | - |
dc.identifier.citationStartPage | 269 | - |
dc.identifier.citationEndPage | 271 | - |
dc.identifier.citationTitle | 대한전자공학회 | - |
dc.description.isOpenAccess | N | - |
dc.contributor.affiliatedAuthor | 김준우 | - |
dc.contributor.affiliatedAuthor | 이광준 | - |
dc.contributor.affiliatedAuthor | 정재욱 | - |
dc.contributor.affiliatedAuthor | 최병대 | - |
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