Photoresist-free Direct Lithography of Colloidal Quantum Dots
- Title
- Photoresist-free Direct Lithography of Colloidal Quantum Dots
- Alternative Title
- 포토레지스트를 사용하지 않는 양자점 광 리소그래피 기술
- Author(s)
- Hyunju Kim
- DGIST Authors
- Hyunju Kim ; Jong-Soo Lee ; Nak Cheon Jeong
- Advisor
- 이종수
- Co-Advisor(s)
- Nak Cheon Jeong
- Issued Date
- 2022
- Awarded Date
- 2022/02
- Type
- Thesis
- Description
- quantum dot, QLED, direct lithography, patterning, photoluminescence
- Table Of Contents
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I. Introduction 1
II. Experimental Section 6
2.1 Chemicals 6
2.2 Patterning Process 7
2.3 Fabrication of QLED 7
2.4 Characterization 8
III. Result and Discussion 9
3.1 Description of direct lithography of colloidal quantum dot 9
3.2 High-resolution patterns of QD film 16
3.3 Optical properties of patterned QDs with direct lithography 18
3.4 Electroluminescence properties of patterned QDs with direct lithography 24
IV. Conclusion 28
V. References 29
- URI
-
http://dgist.dcollection.net/common/orgView/200000593314
http://hdl.handle.net/20.500.11750/16311
- Degree
- Master
- Department
- Energy Science & Engineering
- Publisher
- DGIST
- Related Researcher
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Lee, Jong-Soo
- Research Interests Design of new type of multifunctional nanoparticles for energy-related devices; 다기능성 나노재료; 무기물 태양전지; 열전소자
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- Files in This Item:
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- Appears in Collections:
- Department of Energy Science and Engineering Theses Master
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