Title

Photoresist-free Direct Lithography of Colloidal Quantum Dots

Alternative Title

포토레지스트를 사용하지 않는 양자점 광 리소그래피 기술

DGIST Authors

Hyunju Kim ; Jong-Soo Lee ; Nak Cheon Jeong

Advisor

이종수

Co-Advisor(s)

Nak Cheon Jeong

Issued Date

2022

Awarded Date

2022/02

Citation

Hyunju Kim. (2022). Photoresist-free Direct Lithography of Colloidal Quantum Dots. doi: 10.22677/thesis.200000593314

Type

Thesis

Subject

quantum dot, QLED, direct lithography, patterning, photoluminescence

Description

quantum dot, QLED, direct lithography, patterning, photoluminescence

Table Of Contents

I. Introduction 1
II. Experimental Section 6
2.1 Chemicals 6
2.2 Patterning Process 7
2.3 Fabrication of QLED 7
2.4 Characterization 8
III. Result and Discussion 9
3.1 Description of direct lithography of colloidal quantum dot 9
3.2 High-resolution patterns of QD film 16
3.3 Optical properties of patterned QDs with direct lithography 18
3.4 Electroluminescence properties of patterned QDs with direct lithography 24
IV. Conclusion 28
V. References 29

URI

http://dgist.dcollection.net/common/orgView/200000593314
http://hdl.handle.net/20.500.11750/16311

DOI

10.22677/thesis.200000593314

Degree

Master

Department

Energy Science & Engineering

Publisher

DGIST

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