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Photoresist-free Direct Lithography of Colloidal Quantum Dots
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Title
Photoresist-free Direct Lithography of Colloidal Quantum Dots
Alternative Title
포토레지스트를 사용하지 않는 양자점 광 리소그래피 기술
DGIST Authors
Hyunju KimJong-Soo LeeNak Cheon Jeong
Advisor
이종수
Co-Advisor(s)
Nak Cheon Jeong
Issued Date
2022
Awarded Date
2022/02
Citation
Hyunju Kim. (2022). Photoresist-free Direct Lithography of Colloidal Quantum Dots. doi: 10.22677/thesis.200000593314
Type
Thesis
Subject
quantum dot, QLED, direct lithography, patterning, photoluminescence
Description
quantum dot, QLED, direct lithography, patterning, photoluminescence
Table Of Contents
I. Introduction 1
II. Experimental Section 6
2.1 Chemicals 6
2.2 Patterning Process 7
2.3 Fabrication of QLED 7
2.4 Characterization 8
III. Result and Discussion 9
3.1 Description of direct lithography of colloidal quantum dot 9
3.2 High-resolution patterns of QD film 16
3.3 Optical properties of patterned QDs with direct lithography 18
3.4 Electroluminescence properties of patterned QDs with direct lithography 24
IV. Conclusion 28
V. References 29
URI
http://dgist.dcollection.net/common/orgView/200000593314
http://hdl.handle.net/20.500.11750/16311
DOI
10.22677/thesis.200000593314
Degree
Master
Department
Energy Science & Engineering
Publisher
DGIST
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