Novel negative-type photocurable imide UV monomers were synthesized and characterized for an application to interdielectric layer in TFT-LCD array. Two different imide-type UV monomers were synthesized through 2 step reaction. In addition, alkali developable polymer matrix was also prepared by free radical random copolymerization of benzylmethacrylate and methacrylic acid in THF at 65°C. It was found from photolithographic process that via-hole with good resolution were obtained using optimum formulations, suitable for spin coating process, of negative-type imide UV monomers, photoinitiator, UV oligomer, and alkali developable polymer matrix.
