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Synthesis of Imide UV Monomers for Application to Interdielectric Layer of TFT-LCD Array
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- Title
- Synthesis of Imide UV Monomers for Application to Interdielectric Layer of TFT-LCD Array
- DGIST Authors
- Hur, Youngjune ; Kim, Soon Hak ; Kim, Hyo-Jin ; Han, Yoon Soo ; Park, Lee Soon ; Kwon, Younghwan
- Issued Date
- 2007-01
- Citation
- Hur, Youngjune. (2007-01). Synthesis of Imide UV Monomers for Application to Interdielectric Layer of TFT-LCD Array. doi: 10.1080/15421400701495575
- Type
- Article
- Article Type
- Article; Proceedings Paper
- Author Keywords
- interdielectric layer ; negative-type imide UV monomer ; photolithographic process ; TFT-LCD
- Keywords
- Interdielectric Layer ; Interdielectric Layer ; Interdielectric Layers ; Liquid Crystal Displays ; Monomers ; Negative-Type Imide Uv Monomer ; Negative-Type Imide Uv Monomer ; Negative-Type Imide Uv Monomers ; Photolithographic Process ; Photolithographic Process ; Photolithography ; Polymer Matrix ; Synthesis (Chemical) ; TFT-LCD ; Ultra-Violet Radiation
- ISSN
- 1542-1406
- Abstract
-
Novel negative-type photocurable imide UV monomers were synthesized and characterized for an application to interdielectric layer in TFT-LCD array. Two different imide-type UV monomers were synthesized through 2 step reaction. In addition, alkali developable polymer matrix was also prepared by free radical random copolymerization of benzylmethacrylate and methacrylic acid in THF at 65°C. It was found from photolithographic process that via-hole with good resolution were obtained using optimum formulations, suitable for spin coating process, of negative-type imide UV monomers, photoinitiator, UV oligomer, and alkali developable polymer matrix.
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- Publisher
- Taylor & Francis
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