Synthesis of Imide UV Monomers for Application to Interdielectric Layer of TFT-LCD Array
- Title
- Synthesis of Imide UV Monomers for Application to Interdielectric Layer of TFT-LCD Array
- Author(s)
- Hur, Youngjune ; Kim, Soon Hak ; Kim, Hyo-Jin ; Han, Yoon Soo ; Park, Lee Soon ; Kwon, Younghwan
- DGIST Authors
- Hur, Youngjune ; Kim, Soon Hak ; Kim, Hyo-Jin ; Han, Yoon Soo ; Park, Lee Soon ; Kwon, Younghwan
- Issued Date
- 2007-01
- Type
- Article
- Article Type
- Article; Proceedings Paper
- Author Keywords
- interdielectric layer ; negative-type imide UV monomer ; photolithographic process ; TFT-LCD
- Keywords
- Interdielectric Layer ; Interdielectric Layer ; Interdielectric Layers ; Liquid Crystal Displays ; Monomers ; Negative-Type Imide Uv Monomer ; Negative-Type Imide Uv Monomer ; Negative-Type Imide Uv Monomers ; Photolithographic Process ; Photolithographic Process ; Photolithography ; Polymer Matrix ; Synthesis (Chemical) ; TFT-LCD ; Ultra-Violet Radiation
- ISSN
- 1542-1406
- Abstract
- Novel negative-type photocurable imide UV monomers were synthesized and characterized for an application to interdielectric layer in TFT-LCD array. Two different imide-type UV monomers were synthesized through 2 step reaction. In addition, alkali developable polymer matrix was also prepared by free radical random copolymerization of benzylmethacrylate and methacrylic acid in THF at 65°C. It was found from photolithographic process that via-hole with good resolution were obtained using optimum formulations, suitable for spin coating process, of negative-type imide UV monomers, photoinitiator, UV oligomer, and alkali developable polymer matrix.
- Publisher
- Taylor & Francis
- Files in This Item:
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- Appears in Collections:
- ETC 1. Journal Articles
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