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dc.contributor.author Park, CY[Park, Chang-Yup] ko
dc.contributor.author You, CY[You, Chun-Yeol] ko
dc.contributor.author Jeon, KR[Jeon, Kun-Rok] ko
dc.contributor.author Shin, SC[Shin, Sung-Chul] ko
dc.date.available 2017-07-11T06:55:15Z -
dc.date.created 2017-04-10 -
dc.date.issued 2012-05-28 -
dc.identifier.citation Applied Physics Letters, v.100, no.22 -
dc.identifier.issn 0003-6951 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/3365 -
dc.description.abstract We investigated the correlation between the ferromagnetism and electric resistivity of Mo-doped (3-10 at.) In 2O 3 films. We find that the saturation magnetization increases with the Mo concentration until it reaches its maximum at 7 at. Mo doping (7.1 emu/cm 3), after which it rapidly decreases upon higher doping concentration. Interestingly, the resistivity reveals opposite behavior with the Mo concentration, showing a minimum value at 7 at. Mo doping. According to the temperature-dependent resistivity and the Hall effect measurements, we find that the samples with higher magnetization show metallic behavior with higher electron concentration. Notably, the samples show a linear relationship between the carrier concentration and the degree of magnetization. We believe the ferromagnetism in Mo-doped In 2O 3 is ascribed to the indirect exchange interaction mediated by the charge carriers. © 2012 American Institute of Physics. -
dc.publisher American Institute of Physics Publishing -
dc.subject Doping Concentration -
dc.subject Electric Conductivity -
dc.subject Electron Concentration -
dc.subject Ferromagnetism -
dc.subject Hall Effect Measurement -
dc.subject Indirect Exchange Interactions -
dc.subject Linear Relationships -
dc.subject Metallic Behaviors -
dc.subject Minimum Value -
dc.subject Mo Concentration -
dc.subject Saturation Magnetization -
dc.subject Semiconductor Doping -
dc.subject Temperature-Dependent Resistivity -
dc.title Charge-carrier mediated ferromagnetism in Mo-doped In2O3 films -
dc.type Article -
dc.identifier.doi 10.1063/1.4722928 -
dc.identifier.wosid 000304823800029 -
dc.identifier.scopusid 2-s2.0-84862146433 -
dc.type.local Article(Overseas) -
dc.type.rims ART -
dc.description.journalClass 1 -
dc.contributor.nonIdAuthor Park, CY[Park, Chang-Yup] -
dc.contributor.nonIdAuthor You, CY[You, Chun-Yeol] -
dc.contributor.nonIdAuthor Jeon, KR[Jeon, Kun-Rok] -
dc.identifier.citationVolume 100 -
dc.identifier.citationNumber 22 -
dc.identifier.citationTitle Applied Physics Letters -
dc.type.journalArticle Article -
dc.contributor.affiliatedAuthor Shin, SC[Shin, Sung-Chul] -
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