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Electrical characterization of a-InGaZnO thin-film transistors with Cu source/drain electrodes
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dc.contributor.author Jeong, Jae Wook -
dc.contributor.author Lee, Gwang Jun -
dc.contributor.author Kim, Joonwoo -
dc.contributor.author Choi, Byeongdae -
dc.date.available 2017-07-11T06:56:43Z -
dc.date.created 2017-04-10 -
dc.date.issued 2012-03 -
dc.identifier.issn 0003-6951 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/3383 -
dc.description.abstract We analyzed the effects of Cu source/drain (S/D) electrodes on the performance of a-InGaZnO (a-IGZO) thin-film transistors (TFTs). Owing to the Cu migration, the parasitic resistance was as low as 10 cm with small current transfer length. Based on the transfer characteristics, we found that V DS dependent Cu migration creates donor-like deep and tail states in the sub-bandgap region. The feasibility of Cu S/D electrodes for a-IGZO TFTs using inverter circuits indicates that fabrication of high performance circuits is possible by controlling the Cu electro-migration. © 2012 American Institute of Physics. -
dc.language English -
dc.publisher American Institute of Physics -
dc.title Electrical characterization of a-InGaZnO thin-film transistors with Cu source/drain electrodes -
dc.type Article -
dc.identifier.doi 10.1063/1.3694273 -
dc.identifier.wosid 000302204900040 -
dc.identifier.scopusid 2-s2.0-84859970448 -
dc.identifier.bibliographicCitation Jeong, Jae Wook. (2012-03). Electrical characterization of a-InGaZnO thin-film transistors with Cu source/drain electrodes. Applied Physics Letters, 100(11). doi: 10.1063/1.3694273 -
dc.description.isOpenAccess FALSE -
dc.citation.number 11 -
dc.citation.title Applied Physics Letters -
dc.citation.volume 100 -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -
dc.relation.journalResearchArea Physics -
dc.relation.journalWebOfScienceCategory Physics, Applied -
dc.type.docType Article -
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