Cited time in webofscience Cited time in scopus

Combinational Approach of Electrochemical Etching and Metal-Assisted Chemical Etching for p-Type Silicon Wire Formation

Title
Combinational Approach of Electrochemical Etching and Metal-Assisted Chemical Etching for p-Type Silicon Wire Formation
Author(s)
Jang, Hwan SooChoi, Ho-JinOh, Byeong-YunKim, Jae Hyun
Issued Date
2011
Citation
Electrochemical and Solid State Letters, v.14, no.1, pp.D5 - D9
Type
Article
Keywords
ABSORPTIONARRAYSAspect RatioCrystal OrientationElectrochemical EtchingEtch PitsFabricationHydrofluoric ACIDKoh EtchingMACROPORE FORMATIONManufacturing CostMetal-Assisted Chemical EtchingNew ProcessP-Type SiliconPhotonic CrystalsPhotovoltaic ApplicationsPorous SiliconPotassium HydroxideSilicon SubstratesSilicon WiresWire
ISSN
1099-0062
Abstract
Ordered porous silicon and silicon wire arrays are conventionally fabricated by electrochemical etching in an electrolyte incorporating hydrofluoric acid through formation of a periodical etch pit with an inversed pyramid shape created by KOH etching depending on the crystal orientation of silicon. We propose a new process to form an etch pit using metal-assisted chemical etching, which is not dependent on the crystal orientation of the silicon substrate. The proposed process involves a simpler electrochemical etching process and lower manufacturing cost. Furthermore, it is exploited to produce p-type silicon wire arrays with aspect ratio of more than 5. © 2010 The Electrochemical Society.
URI
http://hdl.handle.net/20.500.11750/3483
DOI
10.1149/1.3504127
Publisher
Electrochemical and Solid-State
Related Researcher
  • 김재현 Kim, Jae Hyun
  • Research Interests 에너지; 배터리; 고체전해질; 태양전지; 전기차; 리튬이온배터리
Files in This Item:

There are no files associated with this item.

Appears in Collections:
Division of Energy & Environmental Technology 1. Journal Articles

qrcode

  • twitter
  • facebook
  • mendeley

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE