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dc.contributor.author Kim, Soon Hak -
dc.contributor.author Kwon, Young Hwan -
dc.contributor.author Han, Yoon Soo -
dc.contributor.author Hur, Young June -
dc.contributor.author Kwak, Gi Seop -
dc.contributor.author Woo, Chang Min -
dc.contributor.author Hur, Byung Ki -
dc.contributor.author Park, Lee Soon -
dc.date.available 2017-07-11T07:17:52Z -
dc.date.created 2017-04-10 -
dc.date.issued 2008-01 -
dc.identifier.issn 0021-8995 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/3574 -
dc.description.abstract Ag electrodes with line width uniformity for large-sized plasma display panels were successfully fabricated through a photolithographic process using photosensitive Ag pastes with optimized photosensitive properties. The photosensitivity of the Ag electrode pastes in the photolithographic process was investigated as a function of the types and contents of photoinitiators, the molecular weights and acid values of acrylic binders with carboxylic acid groups, and the process variables, such as the UV-light intensity and dose, with a step tablet. This study revealed that the photoinitiator was a major parameter for the photosensitivity of the Ag electrode pastes. With the photosensitivity of the photosensitive Ag electrode pastes optimized by the study of the photoinitiator contents, Ag electrodes with line width uniformity were achieved with an HSP-188 photoinitiator content of 15 wt % on the basis of the reactive monomers, regardless of the variation of the light dose from 250 to 350 mj/cm2 and intensity from 15 to 25 mW/cm2. © 2007 Wiley Periodicals, Inc. -
dc.language English -
dc.publisher John Wiley & Sons Inc. -
dc.title Effect of photosensitivity in acrylic photoreactive electrode pastes on line width uniformity for large-sized plasma display panels -
dc.type Article -
dc.identifier.doi 10.1002/app.27139 -
dc.identifier.wosid 000250822200084 -
dc.identifier.scopusid 2-s2.0-36849072339 -
dc.identifier.bibliographicCitation Journal of Applied Polymer Science, v.107, no.1, pp.658 - 666 -
dc.description.isOpenAccess FALSE -
dc.subject.keywordAuthor lithography -
dc.subject.keywordAuthor photopolimerization -
dc.subject.keywordAuthor processing -
dc.subject.keywordAuthor radiation -
dc.subject.keywordPlus Acrylic Binders -
dc.subject.keywordPlus Acrylic Monomers -
dc.subject.keywordPlus Carboxylic ACIDs -
dc.subject.keywordPlus DERIVATIVES -
dc.subject.keywordPlus Electrical Property -
dc.subject.keywordPlus Electrode Pastes -
dc.subject.keywordPlus Lithography -
dc.subject.keywordPlus Molecular Weight -
dc.subject.keywordPlus Monomer -
dc.subject.keywordPlus Optical Property -
dc.subject.keywordPlus Photoinitiators -
dc.subject.keywordPlus Photolithography -
dc.subject.keywordPlus Photopolimerization -
dc.subject.keywordPlus PHOTOPOLYMERIZATION -
dc.subject.keywordPlus Photosensitivity -
dc.subject.keywordPlus Plasma Display Devices -
dc.subject.keywordPlus Polyacrylic ACID -
dc.subject.keywordPlus Polymer Membrane Electrodes -
dc.subject.keywordPlus PRESSURE-SENSITIVE ADHESIVE -
dc.subject.keywordPlus Processing -
dc.subject.keywordPlus Radiation -
dc.citation.endPage 666 -
dc.citation.number 1 -
dc.citation.startPage 658 -
dc.citation.title Journal of Applied Polymer Science -
dc.citation.volume 107 -
dc.description.journalRegisteredClass scopus -
dc.relation.journalResearchArea Polymer Science -
dc.relation.journalWebOfScienceCategory Polymer Science -
dc.type.docType Article -
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