Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Mohapatra, Debananda | - |
dc.contributor.author | Shin, Yujin | - |
dc.contributor.author | Ansari, Mohd Zahid | - |
dc.contributor.author | Kim, Youn-Hye | - |
dc.contributor.author | Park, Ye Jin | - |
dc.contributor.author | Cheon, Taehoon | - |
dc.contributor.author | Kim, Haekyoung | - |
dc.contributor.author | Lee, Jung Woo | - |
dc.contributor.author | Kim, Soo-Hyun | - |
dc.date.accessioned | 2023-07-17T13:40:17Z | - |
dc.date.available | 2023-07-17T13:40:17Z | - |
dc.date.created | 2023-03-15 | - |
dc.date.issued | 2023-04 | - |
dc.identifier.issn | 2198-3844 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11750/46206 | - |
dc.description.abstract | In searching for unique and unexplored 2D materials, the authors try to investigate for the very first time the use of delaminated V-MXene coupled with precious metal ruthenium (Ru) through atomic layer deposition (ALD) for various contact and noncontact mode of real-time temperature sensing applications at the human–machine interface. The novel delaminated V-MXene (DM-V2CTx) engineered ruthenium-ALD (Ru-ALD) temperature sensor demonstrates a competitive sensing performance of 1.11%°C−1 as of only V-MXene of 0.42%°C−1. A nearly threefold increase in sensing and reversibility performance linked to the highly ordered few-layered V-MXene and selective, well-controlled Ru atomic doping by ALD for the successful formation of Ru@DM-V2CTX heterostructure. The advanced heterostructure formation, the mechanism, and the role of Ru have been comprehensively investigated by ultra-high-resolution transmission/scanning transmission electron microscopies coupled with next-generation spherical aberration correction technology and fast, accurate elemental mapping quantifications, also by ultraviolet photoelectron spectroscopy. To the knowledge, this work is the first to use the novel, optimally processed V-MXene over conventionally used Ti-MXene and its surface-internal structure engineering by Ru-ALD process-based temperature-sensing devices function and operational demonstrations. The current work could potentially motivate the development of multifunctional, future, next-generation, safe, personal healthcare electronic devices by the industrially scalable ALD technique. © 2023 The Authors. Advanced Science published by Wiley-VCH GmbH. | - |
dc.language | English | - |
dc.publisher | John Wiley and Sons Inc | - |
dc.title | Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/advs.202206355 | - |
dc.identifier.wosid | 000936429800001 | - |
dc.identifier.scopusid | 2-s2.0-85148642224 | - |
dc.identifier.bibliographicCitation | Advanced Science, v.10, no.12 | - |
dc.description.isOpenAccess | TRUE | - |
dc.subject.keywordAuthor | atomic layer deposition | - |
dc.subject.keywordAuthor | healthcare monitoring | - |
dc.subject.keywordAuthor | human–machine interface | - |
dc.subject.keywordAuthor | precious metals | - |
dc.subject.keywordAuthor | V2CTX MXene | - |
dc.subject.keywordPlus | TEMPERATURE SENSOR | - |
dc.subject.keywordPlus | TI3C2TX MXENE | - |
dc.subject.keywordPlus | GRAPHENE | - |
dc.subject.keywordPlus | EXFOLIATION | - |
dc.subject.keywordPlus | PHASE | - |
dc.citation.number | 12 | - |
dc.citation.title | Advanced Science | - |
dc.citation.volume | 10 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry; Science & Technology - Other Topics; Materials Science | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary | - |
dc.type.docType | Article | - |