Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ahn, Junhyoung | - |
dc.contributor.author | Eom, Yunji | - |
dc.contributor.author | Choi, Hakjong | - |
dc.contributor.author | Kwon, Soongeun | - |
dc.contributor.author | Yeo, Seonju | - |
dc.contributor.author | Park, Sua | - |
dc.contributor.author | Choi, Kee-Bong | - |
dc.contributor.author | Lee, JaeJong | - |
dc.date.accessioned | 2024-02-14T18:40:16Z | - |
dc.date.available | 2024-02-14T18:40:16Z | - |
dc.date.created | 2023-09-22 | - |
dc.date.issued | 2023-04-25 | - |
dc.identifier.isbn | 9781510662643 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11750/47938 | - |
dc.description.abstract | Nanoimprint lithography (NIL) is the simple method using stamp and UV or thermal curable resins for nanostructures/patterns with low cost, high-throughput, and high resolution. Residual-layer free NIL provides good performance of micro/nano-scale structures functional arrangements with 2/3D layouts. We demonstrated nanohole patterns of 200 nm pore size using residual-layer-free NIL without further process for removing residual layers for reflectance biosensor. The reflectance peaks of gold substrate are enhanced to 8 times using the hexagonal hole patterns of diameter 200 nm, and pitch 400 nm. So, this substrate can be applied for immune reflectance biosensor with magnetic nanoparticles for pre-treatment. © 2023 Society of Photo-Optical Instrumentation Engineers (SPIE) | - |
dc.language | English | - |
dc.publisher | Society of Photo-Optical Instrumentation Engineers (SPIE) | - |
dc.title | Reflectance Biosensor Platform using Residual-Layer-Free Nanoimprint Lithography | - |
dc.type | Conference Paper | - |
dc.identifier.doi | 10.1117/12.2665564 | - |
dc.identifier.scopusid | 2-s2.0-85170638544 | - |
dc.identifier.bibliographicCitation | SPIE Optical Sensors 2023, pp.125721E-1 - 125721E-6 | - |
dc.identifier.url | https://spie.org/optics-optoelectronics/presentation/Reflectance-biosensor-platform-using-residual-layer-free-nanoimprint-lithography/12572-55#_=_ | - |
dc.citation.conferencePlace | CS | - |
dc.citation.conferencePlace | Prague | - |
dc.citation.endPage | 125721E-6 | - |
dc.citation.startPage | 125721E-1 | - |
dc.citation.title | SPIE Optical Sensors 2023 | - |
There are no files associated with this item.