DGIST Scholar: Fabrication and Characterization of Hybrid Si/ZnO Subwavelength Structures as Efficient Antireflection Layer

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Fabrication and Characterization of Hybrid Si/ZnO Subwavelength Structures as Efficient Antireflection Layer

Title: Fabrication and Characterization of Hybrid Si/ZnO Subwavelength Structures as Efficient Antireflection Layer

Author(s): Baek, Seong-Ho ; Park, Jung-Soo ; Jung, Yong-Il ; Park, Il-Kyu ; Kim, Jae Hyun

Subject: Anti-Reflection Coating ; Anti-Reflection Coatings ; Anti-Reflection Layers ; Anti-Reflective Properties ; Broad-Band Spectrum ; Colloid Chemistry ; Fabrication ; Fabrication And Characterizations ; Hybrid Structure ; Hydrothermal Synthesis ; Infrared Devices ; Light Reflection ; Nanorods ; Reflection ; Scanning Electron Microscopy ; Silicon ; Silicon Wire ; Silicon Wires ; Sub-Wavelength Structures ; Three Dimensional ; Zinc Oxide ; ZnO Nanorod ; ZnO Nanorods

Abstract: In this study, we fabricated and characterized three dimensional (3D) silicon (Si)/zinc oxide (ZnO) hybrid subwavelength structures to investigate their antireflective properties. Si nanorods (SiNRs) were fabricated by electrochemical etching, and subsequentially we grew ZnO NRs on SiNR as templates by using hydrothermal synthesis. The morphological and optical properties of hybrid Si/ZnO subwavelength structures were investigated by scanning electron microscopy (SEM) and ultra violet-visible-near infrared (UV-VIS-NIR) spectrophotometer, respectively. The reflectance on SiNRs is greatly reduced comparing with that on the conventional textured Si surface. Moreover, the hybrid SiNR/ZnO NR structures gave the lowest reflectance (<3%) throughout the broadband spectrum range. We suggest that the combination of SiNRs and ZnO NRs trap light, leading to suppressing light reflection and increasing light scattering to the hybrid structures. © 2013 American Scientific Publishers.