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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Han, Sang Wook | - |
| dc.contributor.author | Yun, Won Seok | - |
| dc.contributor.author | Seong, Seungho | - |
| dc.contributor.author | Tahir, Zeeshan | - |
| dc.contributor.author | Kim, Yong Soo | - |
| dc.contributor.author | Ko, Minji | - |
| dc.contributor.author | Ryu, Sunmin | - |
| dc.contributor.author | Bae, Jong-Seong | - |
| dc.contributor.author | Ahn, Chang Won | - |
| dc.contributor.author | Kang, Jeongsoo | - |
| dc.date.accessioned | 2024-03-27T15:10:11Z | - |
| dc.date.available | 2024-03-27T15:10:11Z | - |
| dc.date.created | 2024-02-22 | - |
| dc.date.issued | 2024-02 | - |
| dc.identifier.issn | 1948-7185 | - |
| dc.identifier.uri | http://hdl.handle.net/20.500.11750/56534 | - |
| dc.description.abstract | The Bi2O2Se surfaces are well-known to possess 50% Se vacancies, yet they have shown no in-gap states within the indirect bandgap (similar to 0.8 eV). We have found that the hidden in-gap states arising from the Se vacancies in a 2 x 1 pattern induce a reduced direct bandgap (similar to 0.5 eV). Such a reduced direct bandgap is responsible for the high electron mobility of Bi2O2Se. Moreover, the Bi oxide overlayers of the Bi thin films, formed through air exposure and annealing, unexpectedly exhibit a large direct bandgap (similar to 2.1 eV). The simplified fabrication of Bi oxide overlayers provides promise for improving Bi2O2Se electronic devices and enhancing photocatalytic activity. © 2024 American Chemical Society | - |
| dc.language | English | - |
| dc.publisher | American Chemical Society | - |
| dc.title | Hidden Direct Bandgap of Bi2O2Se by Se Vacancy and Enhanced Direct Bandgap of Bismuth Oxide Overlayer | - |
| dc.type | Article | - |
| dc.identifier.doi | 10.1021/acs.jpclett.3c03223 | - |
| dc.identifier.wosid | 001159204200001 | - |
| dc.identifier.scopusid | 2-s2.0-85184799066 | - |
| dc.identifier.bibliographicCitation | Han, Sang Wook. (2024-02). Hidden Direct Bandgap of Bi2O2Se by Se Vacancy and Enhanced Direct Bandgap of Bismuth Oxide Overlayer. Journal of Physical Chemistry Letters, 15(6), 1590–1595. doi: 10.1021/acs.jpclett.3c03223 | - |
| dc.description.isOpenAccess | FALSE | - |
| dc.subject.keywordPlus | RAMAN-SPECTRA | - |
| dc.subject.keywordPlus | THIN | - |
| dc.subject.keywordPlus | MOBILITY | - |
| dc.citation.endPage | 1595 | - |
| dc.citation.number | 6 | - |
| dc.citation.startPage | 1590 | - |
| dc.citation.title | Journal of Physical Chemistry Letters | - |
| dc.citation.volume | 15 | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Chemistry; Science & Technology - Other Topics; Materials Science; Physics | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Atomic, Molecular & Chemical | - |
| dc.type.docType | Article | - |