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dc.contributor.author Kwon, Sung Min -
dc.contributor.author Won, Jong Kook -
dc.contributor.author Jo, Jeong-Wan -
dc.contributor.author Kim, Jaehyun -
dc.contributor.author Kim, Hee-Joong -
dc.contributor.author Kwon, Hyuck-In -
dc.contributor.author Kim, Jaekyun -
dc.contributor.author Ahn, Sangdoo -
dc.contributor.author Kim, Yong-Hoon -
dc.contributor.author Lee, Myoung Jae -
dc.contributor.author Lee, Hyung-ik -
dc.contributor.author Marks, Tobin J. -
dc.contributor.author Kim, Myung-Gil -
dc.contributor.author Park, Sung Kyu -
dc.date.accessioned 2018-05-06T03:54:00Z -
dc.date.available 2018-05-06T03:54:00Z -
dc.date.created 2018-05-04 -
dc.date.issued 2018-04 -
dc.identifier.issn 2375-2548 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/6290 -
dc.description.abstract We report a general strategy for obtaining high-quality, large-areametal-chalcogenide semiconductor films from precursors combining chelated metal salts with chalcoureas or chalcoamides. Using conventional organic solvents, such precursors enable the expeditious formation of chalco-gels,which are easily transformed into the corresponding highperformance metal-chalcogenide thin films with large, uniform areas. Diverse metal chalcogenides and their alloys (MQx: M = Zn, Cd, In, Sb, Pb; Q = S, Se, Te) are successfully synthesized at relatively low processing temperatures (<400°C). The versatility of this scalable route is demonstrated by the fabrication of large-area thin-film transistors (TFTs), optoelectronic devices, and integrated circuits on a 4-inch Si wafer and 2.5-inch borosilicate glass substrates in ambient air using CdS, CdSe, and In2Se3 active layers. The CdSe TFTs exhibit a maximum field-effect mobility greater than 300 cm2 V-1 s-1 with an on/off current ratio of >107 and good operational stability (threshold voltage shift < 0.5 V at a positive gate bias stress of 10 ks). In addition,metal chalcogenide-based phototransistors with a photodetectivity of >1013 Jones and seven-stage ring oscillators operating at a speed of ∼2.6 MHz (propagation delay of < 27 ns per stage) are demonstrated. © 2018 The Authors. -
dc.language English -
dc.publisher American Association for the Advancement of Science -
dc.title High-performance and scalable metal-chalcogenide semiconductors and devices via chalco-gel routes -
dc.type Article -
dc.identifier.doi 10.1126/sciadv.aap9104 -
dc.identifier.scopusid 2-s2.0-85045750289 -
dc.identifier.bibliographicCitation Science Advances, v.4, no.4 -
dc.description.isOpenAccess TRUE -
dc.subject.keywordPlus OPTICAL-PROPERTIES -
dc.subject.keywordPlus CDSE NANOCRYSTALS -
dc.subject.keywordPlus THIN-FILMS -
dc.subject.keywordPlus BAND-GAP -
dc.subject.keywordPlus OXIDE -
dc.subject.keywordPlus ELECTRONICS -
dc.subject.keywordPlus TRANSITION -
dc.subject.keywordPlus TRANSISTOR -
dc.subject.keywordPlus TFT -
dc.citation.number 4 -
dc.citation.title Science Advances -
dc.citation.volume 4 -
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Division of Nanotechnology 1. Journal Articles

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