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Showing results 1 to 7 of 7

Article
Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2
  • Hong, Tae Eun ; 
  • Choi, Sang-Hyeok ; 
  • Yeo, Seungmin ; 
  • Park, Ji-Yoon ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon ; 
  • Kim, Hoon ; 
  • Kim, Min-Kyu ; 
  • Kim, Hyungjun
  • 2013-01
  • Hong, Tae Eun. (2013-01). Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2. ECS Journal of Solid State Science and Technology, 2(3), P47–P53. doi: 10.1149/2.001303jss
  • Electrochemical Society, Inc.
  • View : 608
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Article
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition
  • Park, Ji-Yoon ; 
  • Yeo, Seungmin ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun ; 
  • Kim, Min-Kyu ; 
  • Kim, Hyungjun ; 
  • Hong, Tae Eun ; 
  • Lee, Do-Joong
  • 2014-10-15
  • Park, Ji-Yoon. (2014-10-15). Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition. Journal of Alloys and Compounds, 610, 529–539. doi: 10.1016/j.jallcom.2014.04.186
  • Elsevier
  • View : 815
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Article
Growth of Highly Conformal TiCx Films Using Atomic Layer Deposition Technique
  • Hong, Tae Eun ; 
  • Choi, Sang-Kyung ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon
  • 2013-04
  • Hong, Tae Eun. (2013-04). Growth of Highly Conformal TiCx Films Using Atomic Layer Deposition Technique. Journal of the American Ceramic Society, 96(4), 1060–1062. doi: 10.1111/jace.12289
  • Wiley Blackwell
  • View : 624
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Article
New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition
  • Ansari, Mohd Zahid ; 
  • Janicek, Petr ; 
  • Namgung, Sook ; 
  • Kim, Hyangil ; 
  • Nandi, Dip K. ; 
  • Cheon, Taehoon ; 
  • Siddiqui, Masoom Raza ; 
  • Imran, Muhammad ; 
  • Jang, Yujin ; 
  • Bae, Jong-Seong ; 
    • et al
  • 2024-03
  • Ansari, Mohd Zahid. (2024-03). New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition. Surfaces and Interfaces, 46. doi: 10.1016/j.surfin.2024.104014
  • Elsevier
  • View : 309
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Article
Preface for the Proceedings of SIMS XIX, Jeju, Korea 2013
  • Lee, Yeonhee ; 
  • Moon, DaeWon ; 
  • Kang, Hee Jae ; 
  • Kim, Kyung Joong ; 
  • Lee, Tae Geol ; 
  • Lee, Jae Cheol ; 
  • Yi, Keewook ; 
  • Hong, Tae Eun
  • 2014-11
  • Lee, Yeonhee. (2014-11). Preface for the Proceedings of SIMS XIX, Jeju, Korea 2013. Surface and Interface Analysis, 46, 1–2. doi: 10.1002/sia.5702
  • Wiley Blackwell
  • View : 793
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Article
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor
  • Ansari, Mohd Zahid ; 
  • Janicek, Petr ; 
  • Park, Ye Jin ; 
  • NamGung, Sook ; 
  • Cho, Bo Yeon ; 
  • Nandi, Dip K. ; 
  • Jang, Yujin ; 
  • Bae, Jong-Seong ; 
  • Hong, Tae Eun ; 
  • Cheon, Taehoon ; 
    • et al
  • 2023-05
  • Ansari, Mohd Zahid. (2023-05). Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor. Applied Surface Science, 620. doi: 10.1016/j.apsusc.2023.156834
  • Elsevier BV
  • View : 212
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Article
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect
  • Mun, Ki-Yeung ; 
  • Hong, Tae Eun ; 
  • Cheon, Taehoon ; 
  • Jang, Yujin ; 
  • Lim, Byoung-Yong ; 
  • Kim, Sunjung ; 
  • Kim, Soo-Hyun
  • 2014-07-01
  • Mun, Ki-Yeung. (2014-07-01). The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect. Thin Solid Films, 562, 118–125. doi: 10.1016/j.tsf.2014.03.088
  • Elsevier
  • View : 746
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