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Showing results 1 to 6 of 6

Issue Date Title Author(s) Journal View
2013-01
Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2

Hong, Tae Eun ;  Choi, Sang-Hyeok ;  Yeo, Seungmin ;  Park, Ji-Yoon ;  Kim, Soo-Hyun ;  Cheon, Taehoon ;  Kim, Hoon ;  Kim, Min-Kyu ;  Kim, Hyungjun

ECS Journal of Solid State Science and Technology, v.2, no.3, pp.P47 - P53, 2013-01

 429
2014-10-15
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition

Park, Ji-Yoon ;  Yeo, Seungmin ;  Cheon, Taehoon ;  Kim, Soo-Hyun ;  Kim, Min-Kyu ;  Kim, Hyungjun ;  Hong, Tae Eun ;  Lee, Do-Joong

Journal of Alloys and Compounds, v.610, pp.529 - 539, 2014-10-15

 593
2013-04
Growth of Highly Conformal TiCx Films Using Atomic Layer Deposition Technique

Hong, Tae Eun ;  Choi, Sang-Kyung ;  Kim, Soo-Hyun ;  Cheon, Taehoon

Journal of the American Ceramic Society, v.96, no.4, pp.1060 - 1062, 2013-04

 473
2014-11
Preface for the Proceedings of SIMS XIX, Jeju, Korea 2013

Lee, Yeonhee ;  Moon, DaeWon ;  Kang, Hee Jae ;  Kim, Kyung Joong ;  Lee, Tae Geol ;  Lee, Jae Cheol ;  Yi, Keewook ;  Hong, Tae Eun

Surface and Interface Analysis, v.46, pp.1 - 2, 2014-11

 655
2023-05
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor

Ansari, Mohd Zahid ;  Janicek, Petr ;  Park, Ye Jin ;  NamGung, Sook ;  Cho, Bo Yeon ;  Nandi, Dip K. ;  Jang, Yujin ;  Bae, Jong-Seong ;  Hong, Tae Eun ;  Cheon, Taehoon ;  et al

Applied Surface Science, v.620, 2023-05

 47
2014-07-01
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect

Mun, Ki-Yeung ;  Hong, Tae Eun ;  Cheon, Taehoon ;  Jang, Yujin ;  Lim, Byoung-Yong ;  Kim, Sunjung ;  Kim, Soo-Hyun

Thin Solid Films, v.562, pp.118 - 125, 2014-07-01

 497
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