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Showing results 1 to 3 of 3

Issue Date	Title Author(s) Journal	View
2019-11	Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices Ansari, Mohd Zahid ; Nandi, Dip K. ; Janicek, Petr ; Ansari, Sajid Ali ; Ramesh, Rahul ; Cheon, Taehoon ; Shong, Bonggeun ; Kim, Soo-Hyun ACS Applied Materials & Interfaces, v.11, no.46, pp.43608 - 43621, 2019-11	563
2024-03	New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition Ansari, Mohd Zahid ; Janicek, Petr ; Namgung, Sook ; Kim, Hyangil ; Nandi, Dip K. ; Cheon, Taehoon ; Siddiqui, Masoom Raza ; Imran, Muhammad ; Jang, Yujin ; Bae, Jong-Seong ; et al Surfaces and Interfaces, v.46, 2024-03	4
2023-05	Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor Ansari, Mohd Zahid ; Janicek, Petr ; Park, Ye Jin ; NamGung, Sook ; Cho, Bo Yeon ; Nandi, Dip K. ; Jang, Yujin ; Bae, Jong-Seong ; Hong, Tae Eun ; Cheon, Taehoon ; et al Applied Surface Science, v.620, 2023-05	57

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