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Article
Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2
  • Hong, Tae Eun ; 
  • Choi, Sang-Hyeok ; 
  • Yeo, Seungmin ; 
  • Park, Ji-Yoon ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon ; 
  • Kim, Hoon ; 
  • Kim, Min-Kyu ; 
  • Kim, Hyungjun
  • 2013-01
  • Hong, Tae Eun. (2013-01). Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2. ECS Journal of Solid State Science and Technology, 2(3), P47–P53. doi: 10.1149/2.001303jss
  • Electrochemical Society, Inc.
  • View : 610
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Article
Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization
  • Yeo, Seungmin ; 
  • Choi, Sang-Hyeok ; 
  • Park, Ji-Yoon ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon ; 
  • Lim, Byoung-Yong ; 
  • Kim, Sunjung
  • 2013-11
  • Yeo, Seungmin. (2013-11). Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization. doi: 10.1016/j.tsf.2013.03.074
  • Elsevier BV
  • View : 772
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Article
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition
  • Park, Ji-Yoon ; 
  • Yeo, Seungmin ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun ; 
  • Kim, Min-Kyu ; 
  • Kim, Hyungjun ; 
  • Hong, Tae Eun ; 
  • Lee, Do-Joong
  • 2014-10-15
  • Park, Ji-Yoon. (2014-10-15). Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition. Journal of Alloys and Compounds, 610, 529–539. doi: 10.1016/j.jallcom.2014.04.186
  • Elsevier
  • View : 816
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