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Issue Date	Title Author(s) Journal	View
2009	Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2 Eom, Tae-Kwang ; Sari, Windu ; Choi, Kyu-Jeong ; Shin, Woong-Chul ; Kim, Jae Hyun ; Lee, Do-Joong ; Kim, Ki-Bum ; Sohn, Hyunchul ; Kim, Soo-Hyun Electrochemical and Solid State Letters, v.12, no.11, pp.D85 - D88, 2009	587
2009	Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2 Eom, Tae-Kwang ; Sari, Windu ; Choi, Kyu-Jeong ; Shin, Woong-Chul ; Kim, Jae Hyun ; Lee, Do-Joong ; Kim, Ki-Bum ; Sohn, Hyunchul ; Kim, Soo-Hyun Electrochemical and Solid State Letters, v.12, no.11, pp.D85 - D88, 2009	48

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