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Showing results 1 to 3 of 3

  • Hong, TE[Hong, Tae Eun]
  • Mun, KY[Mun, Ki-Yeung]
  • Choi, SK[Choi, Sang-Kyung]
  • Park, JY[Park, Ji-Yoon]
  • Kim, SH[Kim, Soo-Hyun]
  • Cheon, T[Cheon, Taehoon]
  • Kim, WK[Kim, Woo Kyoung]
  • Lim, BY[Lim, Byoung-Yong]
  • Kim, S[Kim, Sunjung]
  • 2012-07-31
  • Hong, TE[Hong, Tae Eun]. (2012-07-31). Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant. doi: 10.1016/j.tsf.2012.05.069
  • ELSEVIER SCIENCE SA
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  • Park, Byung Nam
  • Shon, Yeong Soo
  • Choi, Sie Young
  • 2008-02
  • Park, Byung Nam. (2008-02). Effects of a magnetic field on the copper metallization using the electroplating process. Microelectronic Engineering, 85(2), 308–314. doi: 10.1016/j.mee.2007.06.018
  • Elsevier BV
  • View : 1045
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  • Park, Byung Nam
  • Shon, Yeong Soo
  • Choi, Sie Young
  • 2008-02
  • Park, Byung Nam. (2008-02). Effects of a magnetic field on the copper metallization using the electroplating process. Microelectronic Engineering, 85(2), 308–314. doi: 10.1016/j.mee.2007.06.018
  • Elsevier BV
  • View : 1125
  • Download : 0
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