Showing results 1 to 3 of 3
-
Hong, TE[Hong, Tae Eun]
;
-
Mun, KY[Mun, Ki-Yeung]
;
-
Choi, SK[Choi, Sang-Kyung]
;
-
Park, JY[Park, Ji-Yoon]
;
-
Kim, SH[Kim, Soo-Hyun]
;
-
Cheon, T[Cheon, Taehoon]
;
-
Kim, WK[Kim, Woo Kyoung]
;
-
Lim, BY[Lim, Byoung-Yong]
;
-
Kim, S[Kim, Sunjung]
- 2012-07-31
- Hong, TE[Hong, Tae Eun]. (2012-07-31). Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant. doi: 10.1016/j.tsf.2012.05.069
- ELSEVIER SCIENCE SA
- View : 767
- Download : 0
-
Park, Byung Nam
;
-
Shon, Yeong Soo
;
-
Choi, Sie Young
- 2008-02
- Park, Byung Nam. (2008-02). Effects of a magnetic field on the copper metallization using the electroplating process. Microelectronic Engineering, 85(2), 308–314. doi: 10.1016/j.mee.2007.06.018
- Elsevier BV
- View : 1045
- Download : 0
-
Park, Byung Nam
;
-
Shon, Yeong Soo
;
-
Choi, Sie Young
- 2008-02
- Park, Byung Nam. (2008-02). Effects of a magnetic field on the copper metallization using the electroplating process. Microelectronic Engineering, 85(2), 308–314. doi: 10.1016/j.mee.2007.06.018
- Elsevier BV
- View : 1125
- Download : 0
1