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Article
Influence of post-annealing on structural, optical and electrical properties of tin nitride thin films prepared by atomic layer deposition
  • Ansari, M.Z. ; 
  • Janicek, P. ; 
  • Nandi, D.K. ; 
  • Palka, K. ; 
  • Slang, S. ; 
  • Kim, D.H. ; 
  • Cheon, T. ; 
  • Kim, S.-H.
  • 2021-02
  • Ansari, M.Z. (2021-02). Influence of post-annealing on structural, optical and electrical properties of tin nitride thin films prepared by atomic layer deposition. Applied Surface Science, 538, 147920. doi: 10.1016/j.apsusc.2020.147920
  • Elsevier B.V.
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Article
Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices
  • Ansari, Mohd Zahid ; 
  • Nandi, Dip K. ; 
  • Janicek, Petr ; 
  • Ansari, Sajid Ali ; 
  • Ramesh, Rahul ; 
  • Cheon, Taehoon ; 
  • Shong, Bonggeun ; 
  • Kim, Soo-Hyun
  • 2019-11
  • Ansari, Mohd Zahid. (2019-11). Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. ACS Applied Materials & Interfaces, 11(46), 43608–43621. doi: 10.1021/acsami.9b15790
  • American Chemical Society
  • View : 870
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