Showing results 1 to 4 of 4
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Park, Byung Nam
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Shon, Yeong Soo
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Choi, Sie Young
- 2008-02
- Park, Byung Nam. (2008-02). Effects of a magnetic field on the copper metallization using the electroplating process. Microelectronic Engineering, 85(2), 308–314. doi: 10.1016/j.mee.2007.06.018
- Elsevier BV
- View : 1045
- Download : 0
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Park, Byung Nam
;
-
Shon, Yeong Soo
;
-
Choi, Sie Young
- 2008-02
- Park, Byung Nam. (2008-02). Effects of a magnetic field on the copper metallization using the electroplating process. Microelectronic Engineering, 85(2), 308–314. doi: 10.1016/j.mee.2007.06.018
- Elsevier BV
- View : 1125
- Download : 0
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Eom, Tae-Kwang
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Sari, Windu
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Choi, Kyu-Jeong
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Shin, Woong-Chul
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Kim, Jae Hyun
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Lee, Do-Joong
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Kim, Ki-Bum
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Sohn, Hyunchul
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Kim, Soo-Hyun
- 2009
- Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
- Electrochemical Society
- View : 314
- Download : 0
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Eom, Tae-Kwang
;
-
Sari, Windu
;
-
Choi, Kyu-Jeong
;
-
Shin, Woong-Chul
;
-
Kim, Jae Hyun
;
-
Lee, Do-Joong
;
-
Kim, Ki-Bum
;
-
Sohn, Hyunchul
;
-
Kim, Soo-Hyun
- 2009
- Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
- Electrochemical Society
- View : 874
- Download : 0
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