Browsing by Titles

All A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

Showing results 1 to 3 of 3

Driving inward growth of lithium metal in hollow microcapsule hosts by heteroatom-controlled nucleation

Article
Driving inward growth of lithium metal in hollow microcapsule hosts by heteroatom-controlled nucleation
  • Kim, Siwon ; 
  • Shin, Hong Rim ; 
  • Kim, Ki Jae ; 
  • Park, Min-Sik ; 
  • Lee, Jong-Won
  • 2024-08
  • Kim, Siwon. (2024-08). Driving inward growth of lithium metal in hollow microcapsule hosts by heteroatom-controlled nucleation. Carbon Energy, 6(8). doi: 10.1002/cey2.525
  • Wiley
  • View : 157
  • Download : 61
Article
Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2
  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 335
  • Download : 0
Article
Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2
  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 901
  • Download : 0
1