Cited 0 time in
Cited 0 time in
Design of Thin-Film Interlayer between Silicon Electrode and Current Collector Using a Chemo-Mechanical Degradation Model
- Design of Thin-Film Interlayer between Silicon Electrode and Current Collector Using a Chemo-Mechanical Degradation Model
- Appiah, Williams Agyei; Roh, Youngjoon; Dzakpasu, Cyril Bubu; Ryou, Myung-Hyun; Lee, Yong Min
- DGIST Authors
- Lee, Yong Min
- Issue Date
- Journal of the Electrochemical Society, 167(8), 080542
- Article Type
- Author Keywords
- Silicon anode; Capacity fade model; Thin film interlayer; Delamination; Lithium ion batteries
- ELECTROCHEMICAL PERFORMANCE; BATTERY ANODES; HIGH-CAPACITY; CYCLE LIFE; LITHIUM; INTERPHASE; CHEMISTRY; MECHANISM; ADHESIVE; BINDER
- To enhance delamination limitations in silicon electrode, a thin-film interlayer between silicon electrode and copper current collector is designed using a chemo-mechanical degradation model. The chemo-mechanical degradation model considers the formation of the solid electrolyte interphase on the surface and within the cracks of the silicon electrode, the physical isolation of active materials and the resistance due to loss of contact between the silicon composite electrode and the copper foil as the main capacity fading mechanisms. The model is validated with experimental data collected from coin cells made of silicon electrode with a bare and an adhesive thin film laminated copper foil. The reduction in the delamination limitations depends on the interplay of the adhesion strength, conductivity, coverage and thickness of adhesive thin film on the surface of the copper foil. © 2020 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.
- Electrochemical Society, Inc.
- Related Researcher
Lee, Yong Min
Battery Materials & Systems LAB
Electrode; Electrolyte; Separator; Simulation
There are no files associated with this item.
- Department of Energy Science and EngineeringBattery Materials & Systems LAB1. Journal Articles
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.