Department of Energy Science and Engineering Polymer Energy Materials Lab 3. Patents
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저온 용액 공정을 이용한 유기 반도체 고분자 패턴의 제조방법

Title
저온 용액 공정을 이용한 유기 반도체 고분자 패턴의 제조방법
Alternative Title
Method of forming organic polymer semiconductor pattern by low-temperature solution process
Author(s)
심규민 ; 정대성
Country
KO
Application Date
2018-08-17
Application No.
10-2018-0096302
Registration Date
2020-04-29
Publication No.
10-2108040
Assignee
(재)대구경북과학기술원(100/100)
URI
http://hdl.handle.net/20.500.11750/12285 10-2018-0096302
Abstract
본 발명은 저온 용액 공정을 이용하여 유기 반도체 고분자 패턴을 제조하는 방법에 관한 것으로, 보다 상세하게 기판의 제1영역을 표면처리하여 표면성질을 변화시키고, 유기 반도체 고분자를 포함하는 에멀전을 기판 위에 코팅한 후 알코올로 세척하는 단위 코팅 공정을 통해 유기 반도체 패턴을 제조하는 방법에 관한 것이다.
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